Thin film magnetic memory device including memory cells having a magnetic tunnel junction

ABSTRACT

In a tunneling magneto-resistance element, first and second free magnetic layers have a magnetization direction according to storage data. The first and second magnetic layers are arranged with an intermediate layer interposed therebetween. The intermediate layer is formed from a non-magnetic conductor. In data write operation, a data write current having a direction according to a write data level is supplied to the intermediate layer. A magnetic field generated by the current flowing through the intermediate layer magnetizes the first and second free magnetic layers with a looped manner.

RELATED APPLICATION

This application is a continuation of application Ser. No. 10/915,447filed Aug. 11, 2004, U.S. Pat. No. 6,954,374, which is a division ofapplication Ser. No. 10/175,846 filed Jun. 21, 2002, U.S. Pat. No.6,781,874.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The present invention generally relates to a thin film magnetic memorydevice. More particularly, the present invention relates to a randomaccess memory (RAM) including memory cells having a magnetic tunneljunction (MTJ).

2. Description of the Background Art

An MRAM Magnetic Random Access Memory) device has attracted attention asa memory device capable of non-volatile data storage with low powerconsumption. The MRAM device is a memory device capable of non-volatiledata storage using a plurality of thin film magnetic elements formed ina semiconductor integrated circuit and also capable of random access toeach thin film magnetic element.

In particular, recent announcement shows that the use of thin filmmagnetic elements having a magnetic tunnel junction (MTJ) as memorycells significantly improves performance of the MRAM device. The MRAMdevice including memory cells having a magnetic tunnel junction isdisclosed in technical documents such as “A 10 ns Read and WriteNon-Volatile Memory Array Using a Magnetic Tunnel Junction and FETSwitch in each Cell”, ISSCC Digest of Technical Papers, TA7.2, February2000, and “Nonvolatile RAM based on Magnetic Tunnel Junction Elements”,ISSCC Digest of Technical Papers, TA7.3, February 2000.

FIG. 48 is a conceptual diagram illustrating the structure of a memorycell having a magnetic tunnel junction (hereinafter, sometimes simplyreferred to as “MTJ memory cell”) and the data read operation.

Referring to FIG. 48, the MTJ memory cell includes a tunnelingmagneto-resistance element TMR having an electric resistance varyingaccording to the storage data level, and an access transistor ATR forforming a path of a sense current flowing through tunnelingmagneto-resistance element TMR in the data read operation. For example,access transistor ATR is a field effect transistor, and is coupledbetween tunneling magneto-resistance element TMR and a ground voltageVSS.

Tunneling magneto-resistance element TMR has a ferromagnetic materiallayer FL having a fixed magnetization direction (hereinafter, sometimessimply referred to as “fixed magnetic layer”), and a ferromagneticmaterial layer VL that is magnetized in the direction corresponding toan external magnetic field (hereinafter, sometimes simply referred to as“free magnetic layer”). A tunneling barrier TB of an insulator film isinterposed between fixed magnetic layer FL and free magnetic layer VL.Free magnetic layer VL is magnetized either in the same (parallel)direction as, or in the opposite (antiparallel) direction to, that offixed magnetic layer FL according to the storage data level.

For the MTJ memory cell are provided a write word line WWL for datawrite operation, a read word line RWL for data read operation, and a bitline BL serving as a data line for transmitting an electric signalcorresponding to the storage data level in data read and writeoperations.

In data read operation, access transistor ATR is turned ON in responseto activation of read word line RWL. This allows a sense current Is toflow through a current path formed by bit line BL, tunnelingmagneto-resistance element TMR, access transistor ATR and ground voltageVSS.

The electric resistance value of tunneling magneto-resistance elementTMR varies according to the relation between the respectivemagnetization directions of fixed magnetic layer FL and free magneticlayer VL. More specifically, when fixed magnetic layer FL and freemagnetic layer VL have the same (parallel) magnetization direction,tunneling magneto-resistance element TMR has a smaller electricresistance value than when they have opposite (antiparallel)magnetization directions. Hereinafter, the electric resistance values ofthe tunneling magneto-resistance element corresponding to the storagedata levels “1”, “0” are respectively denoted with R1 and R0, whereR1>R0.

The electric resistance value of the tunneling magneto-resistanceelement TMR varies according to the magnetization direction.Accordingly, two magnetization directions of free magnetic layer VL intunneling magneto-resistance element TMR can be stored as two storagedata levels (“1”, “0”), respectively. In other words, free magneticlayer VL corresponds to a storage node of the MTJ memory cell.

A voltage change that occurs at tunneling magneto-resistance element TMRin response to sense current Is varies depending on the magnetizationdirection of free magnetic layer VL, that is, the storage data level.Therefore, sense current Is is supplied to tunneling magneto-resistanceelement TMR after precharging bit line BL to a prescribed voltage, andthe storage data in the MTJ memory cell can be read by sensing a voltagechange on bit line BL.

FIG. 49 is a conceptual diagram illustrating data write operation to theMTJ memory cell.

Referring to FIG. 49, in data write operation, read word line RWL isinactivated and access transistor ATR is turned OFF. In this state, adata write current is supplied to write word line WWL and bit line BL inorder to magnetize free magnetic layer VL in the direction correspondingto the write data. The magnetization direction of free magnetic layer VLis determined by combination of the respective directions of the datawrite current flowing through write word line WWL and bit line BL.

FIG. 50 is a conceptual diagram illustrating the relation between thedirection of the data write current and the magnetization direction indata write operation.

Referring to FIG. 50, the abscissa Hx indicates the direction of a datawrite magnetic field H(BL) generated by the data write current flowingthrough bit line BL. The ordinate Hy indicates the direction of a datawrite magnetic field H(WWL) generated by the data write current flowingthrough write word line WWL.

The magnetization direction of free magnetic layer VL can be rewrittenonly when the sum of the data write magnetic fields H(BL) and H(WWL)reaches the region outside the asteroid characteristic line shown in thefigure. In other words, the magnetization direction of free magneticlayer VL will not change if an applied data write magnetic fieldcorresponds to the region inside the asteroid characteristic line.

In order to rewrite the data stored in tunneling magneto-resistanceelement TMR by data write operation, a current of at least a prescribedlevel must be applied to both write word line WWL and bit line BL. Oncethe magnetization direction, that is, the storage data, is written totunneling magneto-resistance element TMR, it is held in a non-volatilemanner until another data write operation is conducted.

In data read operation as well, sense current Is flows through bit lineBL. However, sense current Is is generally about one to two orderssmaller than the data write current. Therefore, it is less likely thatthe storage data in the MTJ memory cell is erroneously rewritten bysense current Is in the data read operation.

With reduction in memory cell size, the MRAM device using such atunneling magneto-resistance element TMR has the following problems:

The MTJ memory cell stores the data according to the magnetizationdirection of free magnetic layer VL. Provided that the magnetic layerhas a thickness T and a length L in its magnetization direction, themagnetic field strength that must be applied to rewrite themagnetization direction of the free magnetic layer (hereinafter,sometimes referred to as “switching magnetic field strength”) isproportional to T/L. Accordingly, with reduction in memory cell size,the switching magnetic field strength is increased according to thescaling of the size in the in-plane direction.

Moreover, with reduction in memory cell size, magnetic fieldinterference between the fixed magnetic layer and the free magneticlayer is increased inside and outside the MTJ memory cell. As a result,the threshold value of a data write magnetic field required for datawrite operation (which corresponds to the asteroid characteristic linein FIG. 50) varies depending on the write data pattern or becomesasymmetric depending on the direction of the data write magnetic field.

Such a phenomenon hinders scaling of the MTJ memory cell. Therefore,current consumption is increased with reduction in memory cell size.

In order to solve the above problems, U.S. Pat. No. 6,166,948 disclosesthe technology of forming a free magnetic layer of an MTJ memory cellfrom two ferromagnetic material layers having different magneticmoments. Hereinafter, the structure of the free magnetic layer formedfrom two magnetic layers is sometimes referred to as “two-layer storagenode structure”. The structure of the free magnetic layer formed from asingle magnetic layer as shown in FIGS. 48, 49 is sometimes referred toas “single-layer storage node structure”.

FIG. 51 is a cross-sectional view of a conventional tunnelingmagneto-resistance element having a two-layer storage node structure.

Referring to FIG. 51, the conventional tunneling magneto-resistanceelement includes an antiferromagnetic material layer AFL, a fixedmagnetic layer FL, free magnetic layers VL1, VL2, a tunneling barrier TBformed between fixed magnetic layer FL and free magnetic layer VL1, andan intermediate layer IML formed between free magnetic layers VL1, VL2.Intermediate layer IML is formed from a non-magnetic material. The MTJmemory cell having the tunneling magneto-resistance element of FIG. 51stores the data according to the relation between the respectivemagnetization directions of fixed magnetic layer FL and free magneticlayer VL1.

Free magnetic layers VL1, VL2 are arranged with intermediate layer IMLinterposed therebetween. The magnetic moment of free magnetic layer VL1is greater than that of free magnetic layer VL2. Accordingly, themagnetization threshold value for changing the magnetization directionof free magnetic layer VL1 is larger than that of free magnetic layerVL2.

As described above, free magnetic layers VL1, VL2 have differentmagnetic moments. Therefore, when the magnetization direction of freemagnetic layer VL1 changes, the magnetization direction of free magneticlayer VL2 also changes so that free magnetic layer VL2 forms amagnetization loop together with free magnetic layer VL1.

FIG. 52 is a hysteresis diagram illustrating magnetization in thetunneling magneto-resistance element in FIG. 51. FIG. 52 shows themagnetization behavior in the easy-axis direction of free magneticlayers VL1, VL2 in response to a data write magnetic field H.

Hereinafter, how the magnetization direction changes as the data writemagnetic field is increased in the negative direction will be describedwith reference to FIG. 52.

In the region of H>H₀₁ (state 1A), both free magnetic layers VL1, VL2are magnetized in the positive direction (to the right). For H<H₀₁(state 2A), only the magnetization direction of free magnetic layer VL2having a smaller magnetic moment is inverted.

When the magnetic field is further changed in the negative directioninto the region exceeding a threshold value −H₀₂ (state 3A), themagnetization direction of free magnetic layer VL1 having a largermagnetic moment changes from the positive direction to the negativedirection (from right to left). Accordingly, the magnetization directionof free magnetic layer VL2 is also inverted from the state 2A.

When the data write magnetic field H is further increased in thenegative direction into the region of H<−H₀₃ (state 4A), themagnetization directions of both free magnetic layers VL1, VL2 change tothe negative direction (to the left).

Hereinafter, how the magnetization direction changes as the data writemagnetic field H is increased in the positive direction will bedescribed.

In the region of H<−H₀₁ (state 4B), both free magnetic layers VL1, VL2are magnetized in the negative direction (to the left). For H>−H₀₁(state 3B), only the magnetization direction of free magnetic layer VL2having a smaller magnetic moment is inverted.

When the magnetic field is further changed in the positive directioninto the region exceeding a threshold value H₀₂ (state 2B), themagnetization direction of free magnetic layer VL1 having a largermagnetic moment changes from the negative direction to the positivedirection (from left to right). Accordingly, the magnetization directionof free magnetic layer VL2 is also inverted from the state 3B.

When the data write magnetic field H is further increased in thepositive direction into the region of H>H₀₃ (state 1B), themagnetization directions of both free magnetic layers VL1, VL2 change tothe positive direction (to the right).

The free magnetic layers are formed from antiferromagnetic materiallayers having different magnetization threshold values (magneticmoments), and a non-magnetic intermediate layer is interposedtherebetween. The state where the magnetic fields in the upper and lowerfree magnetic layers are inverted with respect to each other is used asa data storage state. This enables reduction in switching magnetic fieldstrength of the free magnetic layers. Moreover, in the data storagestate, the two free magnetic layers are magnetized in a looped manner.This prevents a magnetic flux from being extended outside the MTJ memorycell, thereby suppressing adverse effects of the magnetic fieldinterference.

In the MTJ memory cell having a two-layer storage node structure of FIG.51, however, free magnetic layers VL1, VL2 must have differentmagnetization threshold values (magnetic moments). Accordingly, twomagnetic layers of different materials must be deposited with differentthicknesses, thereby complicating the manufacturing apparatus andmanufacturing process.

In particular, as shown in FIG. 52, the difference between the magneticmoments of free magnetic layers VL1, VL2 significantly affects the datastorage state. Therefore, manufacturing variation of the magneticmoments may possibly cause significant variation in data storagecharacteristics of the MTJ memory cells.

As shown in FIGS. 48, 49 and 52, in the MTJ memory cell, free magneticlayers VL, VL1, VL2 that are magnetized in the direction according tothe storage data are formed near fixed magnetic layer FL andantiferromagnetic material layer AFL having a fixed magnetizationdirection. Therefore, magnetization characteristics in the free magneticlayers may become non-uniform according to the storage data level.

FIG. 53 is a conceptual diagram illustrating non-uniformity ofmagnetization characteristics in the MTJ memory cell having asingle-layer storage node structure.

Referring to FIG. 53, fixed magnetic layer FL and antiferromagneticmaterial layer AFL have the same fixed magnetization direction.Antiferromagnetic material layer AFL is provided in order to morestrongly fix the magnetization direction of fixed magnetic layer FL.

Free magnetic layer VL serving as a storage node is magnetized either inthe positive (+) or negative (−) direction according to the storage datalevel. In FIG. 53, the magnetization direction parallel to that of fixedmagnetic layer FL is defined as positive direction, and themagnetization direction antiparallel to that of fixed magnetic layer FLis defined as negative direction.

Since the plurality of magnetic layers are formed dose to each other, auniform magnetic field ΔHp is applied to free magnetic layer VL in theeasy-axis direction due to magnetostatic coupling of the magnetic fieldsfrom antiferromagnetic material layer AFL and fixed magnetic layer FL.Uniform magnetic field ΔHp acts in the direction antiparallel to themagnetization direction of fixed magnetic layer FL, that is, in thenegative direction. Such a uniform magnetic field ΔHp makes themagnetization characteristics in free magnetic layer VL asymmetricdepending on the direction of the magnetic field.

FIG. 54 is a hysteresis diagram illustrating magnetizationcharacteristics in free magnetic layer VL of FIG. 53. FIG. 54 showsmagnetization behavior of free magnetic layer VL in response to a datawrite magnetic field Hex of the easy-axis direction.

Referring to FIG. 54, in order to magnetize negatively magnetized freemagnetic layer VL in the positive direction, a magnetic field Hex of thepositive direction beyond +Hsp must be applied thereto. On the otherhand, in order to magnetize positively magnetized free magnetic layer VLin the negative direction, a magnetic field Hex of the negativedirection beyond −Hsn must be applied thereto.

Due to the uniform magnetic field ΔHp resulting from magnetostaticcoupling with fixed magnetic layer FL, the magnetization threshold valueHsp of the positive direction is larger than the magnetization thresholdvalue Hsn of the negative direction by ΔHp. Since free magnetic layer VLhas asymmetric magnetization characteristics according to the directionof an applied magnetic field, the strength of the magnetic fieldrequired to be applied to free magnetic layer VL varies depending on thewrite data level. In order to use such a tunneling magneto-resistanceelement as a memory cell, a magnetic field exceeding the largermagnetization threshold value must be applied regardless of the writedata level. In other words, a data write current for generating amagnetic field exceeding the magnetization threshold value Hsp must beapplied even when free magnetic layer VL is to be magnetized in thenegative direction. In this case, an unnecessarily large data writecurrent is required. This may possibly cause increased power consumptionand increased current density in the wirings, resulting in degradedwiring reliability.

Such a phenomenon also occurs in a tunneling magneto-resistance elementhaving a two-layer storage node structure.

FIG. 55 is a conceptual diagram illustrating non-uniformity ofmagnetization characteristics in the MTJ memory cell having a two-layerstorage node structure.

Referring to FIG. 55, in a tunneling magneto-resistance element having atwo-layer storage node structure as well, a uniform magnetic field ΔHpis applied to free magnetic layer VL1 in the easy-axis direction due tomagnetostatic coupling between antiferromagnetic material layer AFL andfixed magnetic layer FL, as in the case of the single-layer storage nodestructure. Such a uniform magnetic field ΔHp makes the magnetizationbehavior in free magnetic layers VL1, VL2 in the easy-axis directionasymmetric.

FIG. 56 is a hysteresis diagram illustrating magnetizationcharacteristics in free magnetic layer FL in FIG. 55.

Referring to FIG. 56, the magnetization behavior of free magnetic layersVL1, VL2 in response to a data write magnetic field Hex of the easy-axisdirection is shifted by ΔHp with respect to the theoreticalcharacteristics shown in FIG. 52 due to the uniform magnetic field ΔHpproduced by magnetostatic coupling with fixed magnetic layer FL. Inother words, threshold values −H₀₁′, −H₀₂′, −H₀₃′ for a magnetic fieldof the negative direction are respectively shifted by ΔHp towardthreshold values +H₀₁, +H₀₂, +H₀₃ for a magnetic field of the positivedirection shown in FIG. 52. As a result, magnetization characteristicsare asymmetric between the magnetic fields of the positive direction andnegative directions. In other words,H₀₁−|H₀₁′|=H₀₂−|−H₀₂′|=H₀₃−|−H₀₃′|=ΔHp.

As described above, in both tunneling magneto-resistance elements havinga single-layer storage node structure and a two-layer storage nodestructure, an unnecessarily high data write current level must beapplied due to the asymmetric magnetization characteristics.

SUMMARY OF THE INVENTION

It is an object of the present invention to provide a thin film magneticmemory device having MTJ memory cells that does not complicate amanufacturing process, has simple magnetization characteristics and iscapable of assuring a sufficient operation margin.

It is another object of the present invention to provide a thin filmmagnetic memory device having MTJ memory cells that have symmetricmagnetization characteristics independently of a write data level.

In summary, according to one aspect of the present invention, a thinfilm magnetic memory device includes a plurality of memory cells forstoring data. Each memory cell includes a magnetic storage portionhaving an electric resistance value varying according to storage data,and a read access element allows a data read current to be selectivelysupplied to the magnetic storage portion corresponding to a memory cellselected for a data read operation. The magnetic storage portionincludes a first magnetic layer having a fixed magnetization direction,second and third magnetic layers that are magnetized in oppositedirections according to an applied data write magnetic field, anon-magnetic, conductive intermediate layer formed between the secondand third magnetic layers, and an insulating layer formed between one ofthe second and third magnetic layers and the first magnetic layer. Indata write operation, at least part of the data write magnetic field isgenerated by a first data write current flowing through the intermediatelayer.

The above thin film magnetic memory device is capable of efficientlymagnetizing two free magnetic layers by using a data write currentflowing through the intermediate layer interposed between the second andthird magnetic layers corresponding to the free magnetic layers.Magnetic fluxes resulting from magnetization of the two free magneticlayers interact with each other. In other words, a magnetic fluxresulting from magnetization of one free magnetic layer serves as amagnetic flux for magnetizing the other free magnetic layer. As aresult, a data write current required to rewrite the magnetizationdirection of the free magnetic layers can be reduced, thereby enablingboth reduction in memory cell size and reduction in power consumptionand magnetic noise.

According to another aspect of the present invention, a thin filmmagnetic memory device includes a plurality of memory cells for storingdata. Each memory cell includes a magnetic storage portion having anelectric resistance value varying according to storage data, and anaccess transistor allows a data read current to be selectively suppliedto the magnetic storage portion corresponding to a memory cell selectedfor a data read operation. The magnetic storage portion includes a firstmagnetic layer having a fixed magnetization direction, second and thirdmagnetic layers that are magnetized in opposite (antiparallel)directions according to an applied data write magnetic field and havedifferent magnetic moments, a non-magnetic intermediate layer formedbetween the second and third magnetic layers, and an insulating layerformed between one of the second and third magnetic layers and the firstmagnetic layer. The thin film magnetic memory device further includes adata write line for passing therethrough a data write current forgenerating the data write magnetic field in data write operation. Theintermediate layer is formed as a planar layer so as to be shared by atleast two of the plurality of memory cells.

In the above thin film magnetic memory device, magnetic fluxes resultingfrom magnetization of the second and third magnetic layers correspondingto free magnetic layers interact with each other. In other words, amagnetic flux resulting from magnetization of one free magnetic layerserves as a magnetic flux for magnetizing the other free magnetic layer.As a result, a data write current required to rewrite the magnetizationdirection of the free magnetic layers can be reduced, thereby enablingboth reduction in memory cell size and reduction in power consumptionand magnetic noise. Moreover, since electric interference between memorycells need no longer be considered, the shape of the intermediate layercan be designed with improved flexibility. This simplifies themanufacturing process and improves the yield.

According to still another aspect of the present invention, a thin filmmagnetic memory device includes a plurality of memory cells for storingdata, and a global data line and a local data line that are arranged ina hierarchical manner. Each memory cell includes a magnetic storageportion having an electric resistance value varying according to amagnetization direction that is rewritten in response to an appliedmagnetic field, and an access element allows a data read current to beselectively supplied to the magnetic storage portion corresponding to amemory cell selected for a data read operation. The global data line andthe local data line pass therethrough a data write current formagnetizing the magnetic storage portion in a direction according towrite data in data write operation.

The above thin film magnetic memory device enables reduction inresistance of a data write current path by using the global/local datalines arranged in a hierarchical manner.

Preferably, magnetic fields respectively generated by the data writecurrents flowing through the global data line and the local data line inthe data write operation interact with each other in a constructivemanner in the magnetic storage portion.

As a result, the data write current required to rewrite themagnetization direction of the magnetic storage portion can be reduced,enabling reduction in power consumption and magnetic noise.

According to yet another aspect of the present invention, a thin filmmagnetic memory device includes a plurality of memory cells for storingdata and a first data write current line. Each memory cell includes amagnetic storage portion having an electric resistance value varyingaccording to storage data. The magnetic storage portion includes a firstmagnetic layer having a fixed magnetization direction, a second magneticlayer that is magnetized in a direction according to a storage datalevel, and an insulating layer formed between the first and secondmagnetic layers. The first data write current line generates a firstdata write magnetic field for magnetizing the second magnetic layer ofat least one memory cell selected for data write operation. Regardlessof the storage data level, the first data write magnetic field includesin the second magnetic layer a component of a direction that cancels acoupling magnetic field applied from the first magnetic layer to thesecond magnetic layer.

The above thin film magnetic memory device enables the second magneticlayer (free magnetic layer) in the magnetic storage portion (tunnelingmagneto-resistance element) to have symmetric magnetizationcharacteristics along the easy-axis direction independently of the writedata level. As a result, a data write current required to write thestorage data can be suppressed. This enables reduction in powerconsumption of the MRAM device and current density on the data writecurrent line, thereby improving operation reliability.

The foregoing and other objects, features, aspects and advantages of thepresent invention will become more apparent from the following detaileddescription of the present invention when taken in conjunction with theaccompanying drawings.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a schematic block diagram showing the overall structure of anMRAM device according to a first embodiment of the present invention.

FIG. 2 is a conceptual diagram showing an example of a memory array inFIG. 1.

FIG. 3 is a conceptual diagram showing an example of an MTJ memory cellhaving a two-layer storage node structure shown in FIG. 2.

FIGS. 4A and 4B are conceptual diagrams illustrating the magnetizationdirection of free magnetic layers in data write operation.

FIG. 5 is a conceptual diagram showing another example of the MTJ memorycell having a two-layer storage node structure.

FIG. 6 is a block diagram showing another example of memory array.

FIG. 7 is a block diagram showing still another example of memory array.

FIG. 8 shows the structure of a memory cell in FIG. 7.

FIG. 9 shows still another example of the MTJ memory cell having atwo-layer storage node structure.

FIG. 10 schematically shows the structure of a memory array according toa second embodiment of the present invention.

FIG. 11 is a circuit diagram showing the structure of a memory block inFIG. 10.

FIG. 12 is a circuit diagram showing the structure of a memory blockaccording to a first modification of the second embodiment.

FIGS. 13A and 13B are conceptual diagrams illustrating how a data writemagnetic field is generated in the memory block according to the firstmodification of the second embodiment.

FIG. 14 schematically shows the structure of a memory array according toa second modification of the second embodiment.

FIG. 15 schematically shows the structure of a memory array according toa third modification of the second embodiment.

FIG. 16 is a circuit diagram illustrating the structure of a memoryblock in FIG. 15.

FIG. 17 is a block diagram showing the structure of a memory arrayaccording to a fourth modification of the second embodiment.

FIG. 18 is a circuit diagram illustrating the structure of a memoryblock in FIG. 17.

FIG. 19 is a block diagram showing the structure of a memory array 10according to a fifth modification of the second embodiment.

FIG. 20 shows the structure of an MTJ memory cell having a single-layerstorage node structure.

FIG. 21 shows the structure of a common MTJ memory cell having atwo-layer storage node structure.

FIG. 22 is a circuit diagram showing the structure of a memory blockaccording to a third embodiment of the present invention.

FIG. 23 is a circuit diagram showing the structure of a memory blockaccording to a first modification of the third embodiment.

FIGS. 24A and 24B are conceptual diagrams illustrating how a data writemagnetic field is generated in the memory block according to the firstmodification of the third embodiment.

FIG. 25 is a circuit diagram showing the structure of a memory blockaccording to a second modification of the third embodiment.

FIG. 26 is a circuit diagram showing the structure of a memory blockaccording to a third modification of the third embodiment.

FIG. 27 is a conceptual diagram showing the structure of an MTJ memorycell having a two-layer storage node structure according to a fourthembodiment of the present invention.

FIGS. 28A and 28B are conceptual diagrams illustrating how a data writemagnetic field is generated in the MTJ memory cell of FIG. 27.

FIG. 29 is a block diagram showing the structure of a memory arrayhaving MTJ memory cells of FIG. 27 arranged in a matrix.

FIG. 30 is a circuit diagram showing the structure of a memory arrayaccording to a first modification of the fourth embodiment.

FIG. 31 is a conceptual diagram illustrating a hierarchical word linestructure according to a second modification of the fourth embodiment.

FIG. 32 is a conceptual diagram illustrating a hierarchical word linestructure according to a third modification of the fourth embodiment.

FIG. 33 is a block diagram showing the structure of a memory arrayaccording to a fifth embodiment of the present invention.

FIG. 34 is a conceptual diagram illustrating the structure of an MTJmemory cell according to the fifth embodiment.

FIG. 35 is an operating waveform chart illustrating data read and writeoperations from and to the MTJ memory cell according to the fifthembodiment.

FIG. 36 is a block diagram showing the structure of a memory arrayaccording to a first modification of the fifth embodiment.

FIG. 37 is a conceptual diagram illustrating the structure of an MTJmemory cell according to the first modification of the fifth embodiment.

FIG. 38 is a block diagram showing the structure of a memory arrayaccording to a second modification of the fifth embodiment.

FIG. 39 is a conceptual diagram showing the structure of an MTJ memorycell according to the second modification of the fifth embodiment.

FIG. 40 is an operating waveform chart illustrating data read and writeoperations from and to the MTJ memory cell according to the secondmodification of the fifth embodiment.

FIG. 41 is a block diagram showing the structure of a memory arrayaccording to a third modification of the fifth embodiment.

FIG. 42 is a conceptual diagram illustrating the structure of an MTJmemory cell according to the third modification of the fifth embodiment.

FIG. 43 is an operating waveform chart illustrating data read and writeoperations from and to the MTJ memory cell according to the thirdmodification of the fifth embodiment.

FIG. 44 is a conceptual diagram illustrating the direction of a datawrite magnetic field according to a sixth embodiment of the presentinvention.

FIG. 45 is a conceptual diagram showing the arrangement of a tunnelingmagneto-resistance element according to the sixth embodiment.

FIG. 46 is a conceptual diagram showing the direction of a data writemagnetic field according to a modification of the sixth embodiment.

FIG. 47 is a conceptual diagram showing the arrangement of a tunnelingmagneto-resistance element according to the modification of the sixthembodiment.

FIG. 48 is a conceptual diagram illustrating the structure of an MTJmemory cell and data read operation therefrom.

FIG. 49 is a conceptual diagram illustrating data write operation to anMTJ memory cell.

FIG. 50 is a conceptual diagram illustrating the relation between thedirection of a data write current and the magnetization direction indata write operation to an MTJ memory cell.

FIG. 51 is a cross-sectional view showing the structure of aconventional tunneling magneto-resistance element having two freemagnetic layers.

FIG. 52 is a hysteresis diagram illustrating magnetization in thetunneling magneto-resistance element in FIG. 51.

FIG. 53 is a conceptual diagram illustrating non-uniformity ofmagnetization characteristics in an MTJ memory cell having asingle-layer storage node structure.

FIG. 54 is a hysteresis diagram illustrating magnetizationcharacteristics in a free magnetic layer in FIG. 53.

FIG. 55 is a conceptual diagram illustrating non-uniformity ofmagnetization characteristics in an MTJ memory cell having a two-layerstorage node structure.

FIG. 56 is a hysteresis diagram illustrating magnetizationcharacteristics in free magnetic layers in FIG. 55.

DESCRIPTION OF THE PREFERRED EMBODIMENTS

Hereinafter, embodiments of the present invention will be described indetail with reference to the accompanying drawings. Note that the samereference numerals and characters denote the same or correspondingportions throughout the figures.

First Embodiment

Referring to FIG. 1, an MRAM device 1 according to the first embodimentof the present invention conducts random access in response to anexternal control signal CMD and an external address signal ADD in orderto receive write data DIN and output read data DOUT.

MRAM device 1 includes a control circuit 5 for controlling the overalloperation of MRAM device 1 in response to control signal CMD, and amemory array 10 having a plurality of MTJ memory cells arranged in amatrix. In memory array 10, a plurality of write word lines WWW and aplurality of read word lines RWL are arranged respectively correspondingto the MTJ memory cell rows (hereinafter, sometimes simply referred toas “memory cell rows”). Bit lines BL and source lines SL are arrangedrespectively corresponding to the MTJ memory cell columns (hereinafter,sometimes simply referred to as “memory cell columns”). The structure ofmemory array 10 will be specifically described later.

MRAM device 1 further includes a row decoder 20, a column decoder 25, aword line driver 30, a word line current control circuit 40 andread/write control circuits 50, 60.

Row decoder 20 conducts row selection in memory array 10 according to arow address RA of address signal ADD. Column decoder 25 conducts columnselection in memory array 10 according to a column address CA of addresssignal ADD. Word line driver 30 selectively activates a read word lineRWL or a write word line WWL based on the row selection result of rowdecoder 20. Row address RA and column address CA together indicate amemory cell selected for data read or write operation (hereinafter,sometimes referred to as “selected memory cell”).

Word line current control circuit 40 applies a data write current towrite word line WWL in data write operation. Read/write control circuit50, 60 correctively refers to a circuit group that is arranged in aregion adjacent to memory array 10 in order to apply a data writecurrent and a sense current (data read current) to bit line BL in dataread and write operations, respectively.

Referring to FIG. 2, memory array 10 includes MTJ memory cells MCa of atwo-layer storage node structure arranged in n rows by m columns (wheren, m is a natural number). Each memory cell MCa includes an accesstransistor ATR and a tunneling magneto-resistance element 100 a.

Read word lines RWL1 to RWLn and write word lines WWL1 to WWLn arearranged respectively corresponding to the memory cell rows. Bit linesBL1 to BLm and source lines SL1 to SLm are arranged respectivelycorresponding to the memory cell columns. Each source line SL1 to SLm iscoupled to the sources of access transistors ATR in a correspondingmemory cell row, and supplies a ground voltage VSS.

Word line current control circuit 40 couples each write word line WWL toground voltage VSS in the region facing word line driver 30 with memoryarray 10 interposed therebetween. This allows a data write current Ip ofa fixed direction to be supplied to a write word line selectivelycoupled to a power supply voltage VDD by word line driver 30.

FIG. 2 exemplarily shows read word lines RWL1, RWL2, RWLn, write wordlines WWL1, WWL2, WWLn, bit lines BL1, BLm, and source lines SL1, SLmcorresponding to the first, second and n^(th) rows and the first andm^(th) columns, and some of the corresponding memory cells.

Referring to FIG. 3, MTJ memory cell MCa in FIG. 2 includes a tunnelingmagneto-resistance element 100 a. Tunneling magneto-resistance element100 a includes an antiferromagnetic material layer 101, a fixed magneticlayer 102, free magnetic layers 103, 104, a tunneling barrier 105, andan intermediate layer 107.

Fixed magnetic layer 102 having a fixed magnetization direction isformed on antiferromagnetic material layer 101. Antiferromagneticmaterial layer 101 is provided in order to fix the magnetizationdirection of fixed magnetic layer 102 more strongly. Tunneling barrier105 is formed between fixed magnetic layer 102 and free magnetic layer103. Free magnetic layers 103, 104 are formed with intermediate layer107 interposed therebetween. Intermediate layer 107 has magneticallyneutral characteristics, and is formed from a non-magnetic conductor.

The shape and electric characteristics of intermediate layer 107 can bearbitrarily determined. According to the first embodiment, bit line BLis formed using intermediate layer 107. More specifically, intermediatelayer 107 is formed as a stripe-shaped metal wiring that extends in thecolumn direction so that intermediate layers 107 in the MTJ memory cellsof the same memory cell column are electrically coupled to each other.This metal wiring serves as bit line BL.

In data write operation, a data write current ±Iw is supplied tointermediate layer 107 (bit line BL). The direction of data writecurrent ±Iw is determined according to the write data level. Moreover,data write current Ip is supplied to write word line WWL extending inthe row direction. Data write current Ip has a fixed directionregardless of the write data level.

A data write magnetic field is generated by data write current ±Iwflowing through intermediate layer 107 (bit line BL), and a magneticfield of the easy-axis (EA) direction is applied to free magnetic layers103, 104 by this data write magnetic field. On the other hand, a datawrite magnetic field is generated by data write current Ip flowingthrough write word line WWL, and a magnetic field of the hard-axis (HA)direction is applied to free magnetic layers 103, 104 by this data writemagnetic field.

Hereinafter, the magnetization direction of the free magnetic layers indata write operation will be described with reference to FIGS. 4A and4B. FIGS. 4A and 4B correspond to a cross-sectional view taken alongline P-Q in FIG. 3.

Referring to FIGS. 4A and 4B, the direction of data write current ±Iwflowing through intermediate layer 107 (bit line BL) varies depending onthe write data level.

FIG. 4A shows the case where a data write current +Iw of the positivedirection is supplied to intermediate layer 107 (bit line BL). When datawrite current Ip is supplied to a corresponding write word line WWL, themagnetization directions of free magnetic layers 103, 104 are rewrittenin response to a data write magnetic field generated by data writecurrent +Iw.

In the present embodiment, free magnetic layers 103, 104 are laminatedeach other with non-magnetic intermediate layer 107 interposedtherebetween. This enables both free magnetic layers 103, 104 to beefficiently magnetized in opposite direction with each other in a loopedmanner by a magnetic field generated by the data write current flowingthrough intermediate layer 107. Magnetic fluxes respectively generatedby magnetization of the two free magnetic layers interact with eachother. In other words, a magnetic flux generated by magnetization of onefree magnetic layer serves as a magnetic flux for magnetizing the other.

This enables reduction in data write current required to generate theswitching magnetic field strength of free magnetic layers 103, 104.Moreover, since the magnetic flux does not extend outside the memorycell, adverse effects on the other memory cells can be suppressed.

Fixed magnetic layer 102 has a fixed magnetization direction.Accordingly, when data write operation is conducted using a data writecurrent +Iw, fixed magnetic layer 102 and free magnetic layer 103 haveopposite (antiparallel) magnetization directions. As a result, tunnelingmagneto-resistance element 100 a has an increased electric resistancevalue.

FIG. 4B shows the case where a data write current −Iw of the negativedirection is supplied to intermediate layer 107 (bit line BL). In thiscase, free magnetic layers 103, 104 are magnetized in the oppositedirections to those in FIG. 4A. Note that, as described before, datawrite current Ip flowing through write word line WWL has a fixeddirection regardless of the write data level.

Accordingly, when data write operation is conducted using data writecurrent −Iw, fixed magnetic layer 102 and free magnetic layer 103 havethe same (parallel) magnetization direction. As a result, tunnelingmagneto-resistance element 100 a has a reduced electric resistancevalue.

The material and thickness of free magnetic layers 103, 104 aredetermined so that the magnetization directions of free magnetic layers103, 104 can be changed only in the MTJ memory cell having a data writecurrent supplied to both a corresponding write word line WWL andintermediate layer 107 (bit line BL). In other words, the material andthickness of free magnetic layers 103, 104 are determined so that thedata can be rewritten only to that MTJ memory cell.

As opposed to the conventional tunneling magneto-resistance element inFIG. 51, in the tunneling magneto-resistance element in the MTJ memorycell according to the first embodiment, free magnetic layers 103, 104need not have different magnetic moments. Accordingly, free magneticlayers 103, 104 can be formed from the same material and with the samethickness. This prevents the manufacturing process from beingcomplicated.

Referring back to FIG. 3, access transistor ART includes source/drainregions (n-type regions) 111, 112 formed at a P-type substrate 110, anda gate electrode 113. Source/drain region 111 is electrically coupled toground voltage VSS.

Read word line RWL is formed using gate electrode 113. Morespecifically, each gate electrode 113 extends in the row direction sothat gate electrodes 113 in the MTJ memory cells of the same memory cellrow are electrically coupled to each other. Access transistor ATR isthus turned ON in response to activation (H level) of a correspondingread word line RWL.

Tunneling magneto-resistance element 100 a is electrically coupled tosource/drain region 112 of access transistor ATR through a barrier metal108 and a via hole 115. Barrier metal 108 is a buffer material forobtaining electric contact with antiferromagnetic material layer 101.

In data read operation, read word line RWL is activated (H level),whereby bit line BL can be pulled down to ground voltage VSS through theelectric resistance of tunneling magneto-resistance element 100 a. Asdescribed before, the electric resistance value of tunnelingmagneto-resistance element 100 a varies according to the relationbetween the respective magnetization directions of free magnetic layer103 and fixed magnetic layer 102. Therefore, the voltage change behaviorof bit line BL varies depending on the storage data of the MTJ memorycell.

In response to a sense current, the voltage on bit line BL changesaccording to the storage data level of MTJ memory cell MCa. Therefore,the storage data of MTJ memory cell MCa can be read by sensing thevoltage change on bit line BL.

Free magnetic layer 104 is provided so as to be magnetized in a loopedmanner together with free magnetic layer 103 in data write operation,and does not have any electrical function in data write and readoperations. Accordingly, free magnetic layer 104 may either be formed asan independent element for every MTJ memory cell as shown in FIG. 3, ormay be formed with a stripe shape like bit line BL.

With the above structure, in data write operation, a data write currentis supplied to both write word line WWL and bit line BL corresponding tothe selected memory cell of the memory array in FIG. 2. In data readoperation, write word line WWL corresponding to the selected memory cellis activated and a voltage on a corresponding bit line BL is sensed.Data write and read operations can be conducted in this way.

FIG. 5 shows another example of the MTJ memory cell having a two-layerstorage node structure.

Referring to FIG. 5, an MTJ memory cell MCb having a two-layer storagenode structure is different from MTJ memory cell MCa of FIG. 3 in thatwrite word line WWL is formed above tunneling magneto-resistance element100 a and bit line BL. Since the structure of MTJ memory cell MCb isotherwise the same as that of MTJ memory cell MCa, detailed descriptionthereof will not be repeated here. Data write and read operations to andfrom MTJ memory cell MCb can be conducted in the same manner as that ofMTJ memory cell MCa.

The above structure eliminates the need to form a wiring layer betweentunneling magneto-resistance element 100 a and access transistor ATR,and thus reduces the distance therebetween. As a result, the aspectratio (the ratio of longitudinal dimension to lateral dimension) of viahole 115 is reduced. This facilitates formation of via hole 115, therebysimplifying the manufacturing process.

FIG. 6 shows another example of memory array 10. Either MTJ memory cellMCa or MCb of FIGS. 2 and 5 may be applied to the structure of FIG. 6.

Referring to FIG. 6, bit line pairs are arranged respectivelycorresponding to the memory cell columns. Each bit line pair includestwo complementary bit lines. FIG. 6 exemplarily shows bit line pairsBLP1, BLPm of the first and m^(th) columns. Bit line pair BLP1 includesbit lines BL1, /BL1, and bit line pair BLPm includes bit lines BLm,/BLm. Hereinafter, bit line pairs BLP1 to BLPm are sometimes generallyreferred to as bit line pairs BLP. Similarly, bit lines /BL1 to /BLm aresometimes generally referred to as bit lines /BL. Bit lines BL, /BL areformed using intermediate layer 107.

The MTJ memory cells are coupled to either bit lines BL or bit lines /BLin every other row. For example, regarding the memory cells of the firstcolumn, the memory cell of the first row is coupled to bit line BL1, andthe memory cell of the second row is coupled to bit line /BL1.Similarly, the memory cells of the odd rows are respectively coupled toone bit lines BL1 to BLm of bit line pairs BLP, and the memory cells ofthe even rows are respectively coupled to the other bit lines /BL1 to/BLm of bit line pairs BLP. Accordingly, when read word line RWL isselectively activated according to the row selection result, either onebit lines BL1 to BLm or the other bit lines /BL1 to /BLm of the bit linepairs are respectively coupled to the corresponding memory cells.

Row decoder 25 activates one of column selection signals YS1 to YSm tothe selected state (H level) according to the decode result of columnaddress CA. Column selection signals YS1 to YSm correspond to the memorycell columns, respectively. A data bus pair DBP for transmitting readdata and write data includes complementary data buses DB, /DB.

Read/write control circuit 50 includes column selection gates CSG1 toCSGm, a data write circuit 51W, and a data read circuit 51R.

Column selection gates CSG1 to CSGm are respectively arranged betweenbit line pairs BLP1 to BLPm and data bus pair DBP. Each column selectiongate CSG1 to CSGm includes a transistor switch that is electricallycoupled between data bus DB and a corresponding bit line BL, and atransistor switch that is electrically coupled between data bus /DB anda corresponding bit line /BL. These transistor switches are turned ON inresponse to activation of a corresponding column selection signal.

For example, column selection gate CSG1 includes a transistor switchthat is electrically coupled between data bus DB and bit line BL1 andturned ON in response to activation of column selection signal YS1, anda transistor switch that is electrically coupled between data bus /DBand bit line /BL1 and turned ON in response to activation of columnselection signal YS1.

Short-circuit transistors EQT1 to EQTm for electrically couplingcorresponding complementary bit lines to each other and control signalsESQ1 to EQSm are provided respectively corresponding to bit line pairsBLP1 to BLPm. Control signal EQS1 to EQSm is activated to H level when acorresponding memory cell column is selected for data write operation.Hereinafter, short-circuit transistors EQT1 to EQTm are sometimesgenerally referred to as short-circuit transistors EQT.

Each short-circuit transistor EQT electrically couple corresponding bitlines BL and /BL to each other in response to activation of acorresponding control signal EQS1 to EQSm to H level. Control signalsEQS1 to EQSm may be replaced with a control signal WE that is activatedto H level in data write operation.

In data write operation, data write circuit 51W sets data buses DB, /DBto power supply voltage VDD and ground voltage VSS, or ground voltageVSS and power supply voltage VDD, respectively, according to write dataDIN. In data write operation, short-circuit transistor EQT is turned ONat least in the selected memory cell column. Therefore, a data writecurrent flows through bit lines BL, /BL of the selected memory cellcolumn as a reciprocating current according to the voltage differencebetween data buses DB, /DB. A data write current Ip is supplied to writeword line WWL of the selected memory cell row. Data write current Ip hasa fixed direction regardless of the write data level.

With the above structure, the direction of data write current ±Iwflowing through bit line BL (/BL) can be easily controlled by merelyswitching the voltages of data buses DB, /DB according to the write datalevel. This simplifies the structure of data write circuit 51W.

Hereinafter, data read operation will be described.

In data read operation, one of data buses DB, /DB can be pulled down toground voltage VSS through a corresponding bit line BL or /BL andtunneling magneto-resistance element 100 a of the selected memory cell.As a result, the voltage on data bus DB or /DB connected to the selectedmemory cell changes according to the storage data level of the selectedmemory cell. Data read circuit 51R produces read data DOUT according tothe voltages on data buses DB, /DB.

Alternatively, memory array 10 may include dummy memory cells (notshown) having an intermediate value of electric resistance values R0 andR1 of the MTJ memory cell so that the selected memory cell and a dummymemory cell are respectively connected to data buses DB, /DB, or databuses /DB, DB in data read operation. In this case, data read circuit51R is capable of conducting complementary data read operation based onthe voltage comparison between data buses DB and /DB. As a result, aread operation margin is improved.

FIG. 7 shows still another example of memory array 10.

Referring to FIG. 7, memory cells MCc having a two-layer storage nodestructure are arranged in n rows by m columns. Moreover, bit lines BLare replaced with write bit lines WBL for write operation and read bitlines RBL for data read operation, and source lines SL are eliminated.

Write bit lines WBL and read bit lines RBL are arranged respectivelycorresponding to the memory cell columns. FIG. 7 exemplarily shows writebit lines WBL1, WBLm and read bit lines RBL1, RBLm corresponding to thefirst and m^(th) columns. Hereinafter, read bit lines RBL1 to RBLm andwrite bit lines WBL1 to WBLm are sometimes generally referred to as readbit lines RBL and write bit lines WBL, respectively.

Referring to FIG. 8, MTJ memory cell MCc having a two-layer storage nodestructure shown in FIG. 7 is different from MTJ memory cell MCa of FIG.5 in that read bit line RBL is provided in the column direction.

Write bit line WBL is formed using intermediate layer 107. In data writeoperation, a data write current ±Iw is supplied to write bit line WBL.In data read operation, however, read/write control circuits 50, 60 seteach write bit line WBL to ground voltage VSS.

Read bit line RBL is electrically coupled to source/drain region 111 ofaccess transistor ATR through a via hole 116. In data read operation,source/drain region 112 serves as a source of access transistor ATR.

As a result, in response to turning-ON of access transistor ATR, a sensecurrent can be supplied to a path formed by read bit line RBL, accesstransistor ATR, tunneling magneto-resistance element 100 a, and writebit line WBL (ground voltage VSS).

Referring back to FIG. 7, in data write operation, data write currentsIp, ±Iw are respectively supplied to write word line WWL and write bitline WBL corresponding to the selected memory cell.

In data read operation, read word line RWL corresponding to the selectedmemory cell is activated, and read bit line RBL corresponding to theselected memory cell can be responsively pulled down to ground voltageVSS through tunneling magneto-resistance element 100 a of the selectedmemory cell. As a result, the voltage on read bit line RBL changesaccording to the storage data level of the selected memory cell, wherebythe storage data can be read from the selected memory cell.

FIG. 9 shows still another example of the MTJ memory cell having atwo-layer storage node structure.

Referring to FIG. 9, MTJ memory cell MCd is different from MTJ memorycell MCb in FIG. 5 in that bit line BL is not formed in intermediatelayer 107 but in an independent metal wiring layer.

More specifically, in FIG. 9, intermediate layer 107 has a fixed voltage(e.g., ground voltage VSS). This eliminates the need to considerelectric interference between the MTJ memory cells. Accordingly,intermediate layer 107 can be formed with any shape such as a planar orstripe shape. In other words, the shape of intermediate layer 107 can bedesigned with improved flexibility. This facilitates the manufacturingprocess and improves manufacturing yield.

Bit line BL extends in the column direction and is electrically coupledto source/drain region 111 of access transistor ATR through via hole116. Source/drain region 112 of access transistor ATR is electricallycoupled to tunneling magneto-resistance element 100 a through via hole115 and barrier metal 108.

In data write operation, data write currents ±Iw, Ip are respectivelysupplied to bit line BL and write word line WWL, whereby free magneticlayers 103, 104 can be magnetized in the direction according to writedata DIN. Note that free magnetic layers 103, 104 of MTJ memory cell MCdare formed from different materials and with different thicknesses so asto have different magnetic moments (magnetization threshold values).

In data read operation, read word line RWL is activated, whereby bitline BL can be pulled down to ground voltage VSS through electricresistance of tunneling magneto-resistance element 100 a. As a result,the voltage on bit line BL changes according to the electric resistancevalue of the tunneling magneto-resistance element, that is, the storagedata level of the MTJ memory cell. The storage data can thus be readfrom the selected memory cell.

By using the MTJ memory cell having a two-layer storage node structureof the first embodiment, increase in data write current amount forgenerating the switching magnetic field strength can be suppressed evenwhen the memory cell size is reduced. This facilitates scaling of thememory cell.

Moreover, provided that the memory cell size is the same, the data writecurrent amount for generating the switching magnetic field strength canbe suppressed, enabling reduction in power consumption. In particular,since a data write current is supplied to the intermediate layerinterposed between two free magnetic layers, the switching magneticfield strength can be obtained efficiently. As a result, data writeoperation can be conducted with a smaller data write current, enablingfurther reduction in current consumption.

Moreover, since the bit line is formed using the intermediate layer inthe tunneling magneto-resistance element, a required number of metalwiring layers is reduced. This increases the number of metal wiringlayers that are available on the region above the MRAM array. Therefore,particularly when a system on-chip device is mounted together with theMRAM device, logic and the like, the logic can be designed with improvedflexibility, enabling reduction in chip size.

Second Embodiment

In the first embodiment, the bit line is formed using the intermediatelayer in the tunneling magneto-resistance element. The intermediatelayer must be designed with a somewhat small thickness. Therefore, whenbit line BL is formed using the intermediate layer extending in thecolumn direction, the electric resistance value thereof may becomerelatively high. This may possibly reduce the read operation speed andmay hinder a sufficient amount of data write current from beingsupplied.

In view of this, in the second embodiment, a so-called “hierarchical bitline structure” is applied to the memory array of the first embodiment,that is, the memory array including MTJ memory cells having a two-layerstorage node structure.

Referring to FIG. 10, in memory array 10 of the second embodiment, mainbit lines MBL and sub bit lines SBL corresponding to the memory cellcolumns are arranged in a hierarchical manner. Main bit lines /MBL andsub bit lines /SBL are also arranged corresponding to the memory cellcolumns. Main bit lines /MBL and sub bit lines /SBL are complementary tomain bit lines MBL and sub bit lines /SBL, respectively. Like bit linesBL of FIGS. 3 and 5, sub bit lines SBL, /SBL are formed usingintermediate layer 107 of tunneling magneto-resistance element 100 a.Main bit lines MBL, /MBL are formed using an independent metal wiringhaving low electric resistance. Main bit lines MBL, /MBL form a main bitline pair MBLP, and sub bit lines SBL, /SBL form a sub bit line pairSBLP.

FIG. 10 exemplarily shows main bit lines MBL1, /MBL1 and MBLm, /MBLm ofthe first and m^(th) columns. Main bit lines MBL1, /MBL1 form a main bitline pair MBLP1, and main bit lines MBLm, /MBLm form a main bit linepair MBLPm. Hereinafter, main bit lines MBL1 to MBLm, /MBL1 to /MBLm aresometimes generally referred to as main bit lines MBL, /MBL,respectively. Main bit line pairs MBLP1 to MBLPm are sometimes generallyreferred to as main bit line pairs MBLP.

Read/write control circuit 50 functions as a supply source of a datawrite current ±Iw to main bit lines MBL, /MBL of the selected memorycell column. For example, read/write control circuit 50 has the samestructure as that of FIG. 6. In this case, read/write control circuit 50couples main bit lines MBL, /MBL of the selected memory cell column topower supply voltage VDD and ground voltage VSS, or ground voltage VSSand power supply voltage VDD, respectively, according to the write datalevel DIN.

Each memory cell column is divided into k memory blocks respectivelycorresponding to the memory cell rows. For example, the MTJ memory cellgroup of the first column is divided into memory blocks MBa11 to MBak1.Similarly, the MTJ memory cell group of the m^(th) column is dividedinto memory blocks MBa1m to MBakm. In the entire memory array 10, memoryblocks MBa11 to MBakm are arranged in k rows by m columns. Hereinafter,memory blocks MBa11 to MBakm are sometimes generally referred to asmemory blocks MBa.

In each memory cell column, two complementary sub bit lines SBL, /SBLare provided in every memory block MBa. Complementary sub bit lines SBL,/SBL form a sub bit line pair SBLP. For example, sub bit lines SBL11,/SBL11 of a sub bit line pair SBLP11 are provided in memory block MBa11.

Hereinafter, sub bit lines SBL11 to SBLkm and /SBL11 to /SBLkm aresometimes generally referred to as sub bit lines SBL and /SBL,respectively.

Block selection signals BS1 to BSk are provided corresponding to therespective memory block rows. Hereinafter, block selection signals BS1to BSk are sometimes generally referred to as block selection signalsBS. Block selection signal BS is activated in the memory block row thatincludes the selected memory cell.

Therefore, a specific memory block including the selected memory cellcan be selected by selecting block selection signal BS and memory cellcolumn (main bit line pair MBLP).

FIG. 11 is a circuit diagram of memory block MBa. Since each memoryblock MBa has the same structure, FIG. 11 exemplarily shows thestructure of memory block MBa11. Sub bit lines SBL11, /SBL11 areprovided in memory block MBa11.

Referring to FIG. 11, memory block MBa11 includes a memory cell grouparranged in a plurality of rows (e.g., three rows) by one column.

Each memory block is shown to have three memory cell rows in the secondembodiment and modifications thereof described below. However, thepresent invention is not limited to this. Each memory block may have anynumber of memory cell rows equal to or larger than two.

As in the structure of FIG. 6, MTJ memory cells MCa of each memory cellcolumn are connected to either sub bit line SBL11 or /SBL11 in everyother row. For example, MTJ memory cells MCa of the odd rows are coupledto sub bit line SBL11, and MTJ memory cells MCa of the even rows arecoupled to sub bit line /SBL11.

Each memory block is shown to have MTJ memory cells MCa in the secondembodiment and modifications thereof described below. However, MTJmemory cells MCa may be replaced with MTJ memory cells MCb or MCd ofFIGS. 5 and 9.

MTJ memory cell MCa includes an access transistor ATR and a tunnelingmagneto-resistance element 100 a. Access transistor ATR is electricallycoupled between tunneling magneto-resistance element 100 a and groundvoltage VSS. Access transistor ATR has its gate coupled to read wordline RWL of a corresponding memory cell row.

Since sub bit lines SBL11, /SBL11 are provided in every memory blockMBa, the wiring length thereof is reduced. This suppresses the electricresistance value of each sub bit line SBL that is formed usingintermediate layer 107 of tunneling magneto-resistance element 100 a.

Memory block MBa11 further includes current switch transistors SWTa,SWTb and a short-circuit transistor EQT11.

Current switch transistor SWTa is electrically coupled between main bitline MBL1 and one end of sub bit line SBL11 (i.e., the end locatedcloser to read/write control circuit 50). Similarly, current switchtransistor SWTb is electrically coupled between main bit line /MBL1 andone end of sub bit line /SBL11 (i.e., the end located closer toread/write control circuit 50). Current switch transistors SWTa, SWTbreceive a block selection signal BS1 at their gates.

Short-circuit transistor EQT11 electrically couples sub bit lines SBL11,/SBL11 to each other at the other ends (i.e., the ends located away fromread/write control circuit 50) in response to a write selection signalWMB11.

Write selection signal WMB11 is activated to H level at least when blockselection signal BS1 is activated in data write operation.Alternatively, write selection signal WMB11 may be activated to H levelin response to activation of block selection signal BL1 and the columnselection result. In other words, write selection signal WMB11 may beactivated to H level when block selection signal BS1 is activated andthe memory cell column corresponding to main bit line pair MBLP1 isselected in data write operation.

When memory block MBa11 is selected for data write operation,short-circuit transistor EQT11 and current switch transistors SWTa, SWTbare turned ON. Read/write control circuit 50 then switches the voltagepolarities (power supply voltage VDD and ground voltage VSS) of main bitlines MBL1, /MBL1 according to write data DIN. As a result, a data writecurrent ±Iw having a direction corresponding to the level of write dataDIN can be supplied to sub bit lines SBL11, /SBL11 as a reciprocatingcurrent through short-circuit transistor EQT11. This simplifies thestructure of read/write control circuit 50 serving as a supply source ofdata write current ±Iw.

Write word line WWL corresponding to the selected memory cell is thenselectively activated to receive a data write current Ip. As a result,write data DIN can be written to the selected memory cell.

On the other hand, when memory block MBa11 is selected for data readoperation, current switch transistors SWTa, STWb are turned ON, whereasshort-circuit transistor EQT11 is turned OFF. As a result, sub bit linesSBL11, /SBL11 are electrically coupled to main bit lines MBL1, /MBL1,respectively.

In the second embodiment, so-called complementary data read operation isconducted using dummy memory cells DMC. For the complementary data readoperation, a dummy memory cell DMC is provided for each main bitlineMBL, /MBL. FIG. 11 exemplarily shows the dummy memory cells respectivelycorresponding to main bit lines MBL1, /MBL1.

Each dummy memory cell DMC includes an access transistor ATR and a dummyresistor Rd. The electric resistance value of dummy resistor Rd is equalto an intermediate value of the electric resistance values R1 and R0 ofthe MTJ memory cell (i.e., R1<Rd<R0). The electric resistance values R1and R0 correspond to the storage data levels “1”, “0”, respectively.

The dummy memory cell corresponding to main bit line MBL1 iselectrically coupled between ground voltage VSS and main bit line MBL1in response to activation of a dummy word line DWL0. The dummy memorycell corresponding to main bit line /MBL1 is electrically coupledbetween main bit line /MBL1 and ground voltage VSS in response toactivation of a dummy word line DWL1.

Dummy word lines DWL0, DWL1 are selectively activated depending onwhether the selected memory cell is located in an odd row or even row.More specifically, when the selected memory cell is located in an oddrow, that is, when the selected memory cell is electrically coupled tomain bit line MBL1, dummy word line DWL1 is activated in order toelectrically couple dummy memory cell DMC to main bit line /MBL1. On theother hand, when the selected memory cell is located in an even row,dummy word line DWL0 is activated in order to electrically couple dummymemory cell DMC to main bit line MBL1.

In data read operation, one of the selected memory cell and dummy memorycell DMC is electrically coupled to one of complementary main bit linesMBL1, /MBL1, and the other is coupled to the other main bit line.Accordingly, the storage data can be read from the selected memory cellby sensing the voltage difference between main bit lines MBL1 and /MBL1.

Sub bit line SBL, /SBL has a short wiring length and thus a low electricresistance value. Therefore, even when the MTJ memory cells having atwo-layer storage node structure of the first embodiment are used forreduced power consumption in data write operation, the read operationspeed will not be reduced.

First Modification of Second Embodiment

In the first modification of the second embodiment, the hierarchical subbit line structure capable of efficiently supplying a data write currentwill be described.

Referring to FIG. 12, according to the first modification of the secondembodiment, memory blocks MBa11 to MBakm in memory array 10 of FIG. 10are replaced with memory blocks MBb11 to MBbkm. Since memory blocksMBb11 to MBbkm have the same structure, FIG. 12 exemplarily shows thestructure of memory block MBb11.

Memory block MBb11 is different from memory block MBa11 of FIG. 11 inthe positions of short-circuit transistor EQT11 and current switchtransistors SWTa, SWTb.

In memory block MBb11, short-circuit transistor EQT11 connects sub bitlines SBL11, /SBL11 to each other at their respective one ends locatedcloser to read/write control circuit 50. Similarly, current switchtransistor SWTa is electrically coupled between the other end of sub bitline SBL11 located away from read/write control circuit 50 and main bitline MBL1. Current switch transistor SWTb is electrically coupledbetween the other end of sub bit line /SBL11 located away fromread/write control circuit 50 and main bit line /MBL1.

With the above structure, a data write current ±Iw flows through mainbit line MBL1 and sub bit line SBL11 in the opposite directions in datawrite operation. Similarly, a data write current ±Iw flows through mainbit line /MBL1 and sub bit line /SBL11 in the opposite directions.

Hereinafter, how a data write magnetic field is generated in the memoryblock of the first modification of the second embodiment will bedescribed with reference to FIGS. 13A and 13B.

FIG. 13A shows a data write magnetic field generated when a data writecurrent +Iw of the positive direction is supplied to sub bit line SBL(/SBL). In this case, a data write current is supplied to main bit lineMBL (/MBL) in the opposite direction. Therefore, the data write magneticfields respectively generated by the data write currents flowing throughsub bit line SBL (/SBL) and main bit line MBL (/MBL) interact with eachother in a constructive manner in free magnetic layer 104. The magneticflux generated by magnetization of one free magnetic layer 104 serves asmagnetic flux for magnetizing the other free magnetic layer 103.Therefore, the switching magnetic field strength can be generated with asmaller data write current.

FIG. 13B shows a data write magnetic field generated when a data writecurrent −Iw of the negative direction is supplied to sub bit line SBL(/SBL). As in the case of FIG. 13A, the data write magnetic fieldsapplied to free magnetic layer 104 interact with each other in aconstructive manner. Therefore, data write operation to the MTJ memorycell can be conducted with a smaller data write current.

Referring back to FIG. 12, since the structure of memory block MBb11 isotherwise the same as that of memory block MBa11 of FIG. 11, detaileddescription thereof will not be repeated. Data read operation in thememory block of the first modification of the second embodiment can beconducted in the same manner as that in memory block MBa of the secondembodiment.

Second Modification of Second Embodiment

In the second modification of the second embodiment, a memory array inwhich each main bit line corresponds to a plurality of memory cellcolumns will be described.

Referring to FIG. 14, in the memory array of the second modification ofthe second embodiment, sub bit lines SBL, /SBL are independentlyprovided in each memory block MBb11 to MBbkm, in each memory cell.Memory blocks MBb11 to MBbkm are arranged in a matrix. Every two sub bitlines SBL, /SBL form a sub bit line pair SBLP. Each main bit line pairMBLP corresponds to a plurality of memory cell columns. In the exampleof FIG. 12, each main bit line pair MBLP corresponds to two memory cellcolumns. Therefore, h main bit lines MBLP1 to MBLPh are provided in theentire memory array 10 (where h is an integer equal to m/2). Since adummy memory cell DMC is provided for each main bit line MBL, /MBL inthe same manner as that in FIG. 11, detailed description thereof willnot be repeated.

Main bit line pair MBLP1 is shared by memory blocks MBb11 to MBbk1 andmemory blocks MBb12 to MBbk2.

Block selection signal BS1 applied to the gates of current switchtransistors SWTa, SWTb in FIG. 12 is divided into a plurality of blockselection signals in order to select one of a plurality of memory cellscorresponding to the same main bit line pair.

In the example of FIG. 14, block selection signal BS1 is divided intotwo block selection signals BS1A, BS1B. Block selection signal BS1A isactivated when a memory block of the first row is selected and theselected memory cell is located in an odd column. On the other hand,block selection signal BS1B is activated when a memory block of thefirst row is selected and the selected memory cell is located in an evencolumn. In other words, one of block selection signals BS1A, BS1Bcorresponding to the same memory block row is activated according towhether the selected memory cell is located in an even column or oddcolumn.

Block selection signals BS1A to BSkA are respectively transmitted tomemory blocks MBb11 to MBbk1, and block selection signals BS1B to BSkBare respectively transmitted to memory blocks MBb12 to MBbk2. A specificmemory block including the selected memory cell can be designated bycombination of main bit line pair MBLP and block selection signal BL1A,BS1B to BSka, BSKb.

The above structure reduces the number of main bit lines required forthe entire memory array 10. As a result, a wiring pitch of the main bitlines is assured.

Accordingly, a sufficient wiring width, that is, a sufficientcross-sectional area, is assured for the main bit lines that receive arelatively large current in data write operation, enabling reduction incurrent density. This suppresses electromigration in the main bit line,enabling improvement in operation reliability of the MRAM device.

Since the number of main bit lines is reduced, the number of dummymemory cells is also reduced. This enables reduction in chip area.

Third Modification of Second Embodiment

In the following modifications of the second embodiment, a memory arrayin which each memory block has an open bit line structure will bedescribed.

Referring to FIG. 15, in memory array 10 of the third modification ofthe second embodiment, memory blocks MBc11 to MBckh are arranged in krows by h columns. Each memory block MBc11 to MBckh includes two memorycell columns. Accordingly, provided that the number of memory cell rowsand the number of memory cell columns are the same as those of thesecond embodiment, the number of memory blocks is reduced by half fromthe second embodiment. Hereinafter, memory blocks MBc11 to MBchk aresometimes generally referred to as memory blocks MBc.

Main bit lines MBL1 to MBLm are arranged respectively corresponding tothe memory cell columns. In other words, each memory block MBccorresponds to a pair of main bit lines MBL.

Write selection signals WMB1A, WMB1B to WMBka, WMBkB are provided inaddition to block selection signals BS1 to BSk of FIG. 10. Writeselection signal WMB1A, WMB1B to WMBkA, WMBkB is selectively activatedaccording to the memory block row of the selected memory cell andwhether the selected memory cell is located in an odd column or evencolumn. For example, write selection signal WMB1A is activated when theselected memory cell corresponds to the first memory block row and islocated in an odd column. Similarly, write selection signal WMB1B isactivated when the selected memory cell corresponds to the first memoryblock row and is located in an even column.

FIG. 16 is a circuit diagram of memory block MBc of FIG. 15. Sincememory blocks MBc11 to MBckh have the same structure, FIG. 16exemplarily shows the structure of memory block MBc11.

Referring to FIG. 16, memory block MBc11 includes memory cells arrangedin three rows by two columns. Sub bit lines SBL11, /SBL11 are providedin memory block MBc11. In each memory cell row, an MTJ memory cell MCais provided for each sub bit line SBL11, /SBL11.

Memory block MBc11 further includes current switch transistors SWTa,SWTb, SWTc, SWTd.

Current switch transistor SWTa is electrically coupled between main bitline MBL1 and one end of sub bit line SBL11 that is located closer toread/write control circuit 50. Current switch transistor SWTb iselectrically coupled between main bit line MBL2(/MBL1) and one end ofsub bit line /SBL11 that is located closer to read/write control circuit50. Current switch transistors SWTa, SWTb receive block selection signalBS1 at their gates.

Current switch transistor SWTc is electrically coupled between main bitline MBL2 and the other end of sub bit line SBL11 that is located awayfrom read/write control circuit 50. Current switch transistor SWTd iselectrically coupled between main bit line MBL1 and the other end of subbit line /SBL11 that is located away from read/write control circuit 50.Current switch transistors SWTc, SWTd receive write selection signalsWMB1A, WMB1B at their gates, respectively.

Hereinafter, data write operation in memory block MBc11 will bedescribed.

When a memory cell connected to sub bit line SBL11 is selected for datawrite operation, block selection signal BS1 and write selection signalWMB1A are activated to H level, and current switch transistors SWTa,SWTb, SWTc are turned ON. Current switch transistor SWTd is turned OFF.As a result, a current path is formed by main bit line MBL1, currentswitch transistor SWTa, sub bit line SBL11, current switch transistorSWTc, and main bit line MBL2 (/MBL1).

Similarly, when a memory cell connected to sub bit line /SBL11 isselected for data write operation, block selection signal BS1 and writeselection signal WMB1B are activated to H level, and current switchtransistors SWTa, SWTb, SWTd are turned ON. Current switch transistorSWTc is turned OFF. As a result, a current path is formed by main bitline MBL1, current switch transistor SWTd, sub bit line /SBL11, currentswitch transistor SWTb, and main bit line MBL2 (/MBL1).

Read/write control circuit 50 sets the voltages of the pair of main bitlines MBL1, MBL2 corresponding to memory block MBc11 in the same manneras that of the voltages of complementary main bit lines MBL1, /MBL1 inFIG. 11. As a result, a data write current ±Iw can be supplied to subbit line SBL11 or /SBL11 in the direction according to the write datalevel DIN.

On the other hand, in data read operation, current switch transistorsSWTc, SWTd are turned OFF, and current switch transistors SWTa, SWTb areturned ON. Accordingly, the memory cells of the selected memory cell roware electrically coupled to main bit lines MBL1, MBL2, respectively. Asa result, the storage data can be read from the selected memory cell bysensing the voltage on main bit line MBL of the selected memory cellcolumn.

With the above structure, the same effects as those of the secondembodiment can be obtained in data read and write operations even whensub bit lines and MTJ memory cells are arranged in each memory blockhaving the open bit line structure.

Fourth Modification of Second Embodiment

Referring to FIG. 17, the memory array of the fourth modification of thesecond embodiment is different from that of the third modification ofthe second embodiment in FIG. 15 in that memory blocks MBc11 to MBckhare replaced with memory blocks MBd11 to MBdkh. Hereinafter, memoryblocks MBd11 to MBdkh are sometimes generally referred to as memoryblock MBd.

Block selection signals BS1 to BSk are divided into block selectionsignals BS1A, BS1B to BSkA, BSkB in order to reflect the columnselection result. Since block selection signals BS1A, BS1B to BSkA, BSkBare set in the same manner as that described before, detaileddescription thereof will not be repeated.

FIG. 18 is a circuit diagram of memory block MBd in FIG. 17. Sincememory blocks MBd11 to MBdkh have the same structure, FIG. 18exemplarily shows the structure of memory block MBd11.

Referring to FIG. 18, memory block MBd11 is different from memory blockMBc11 of FIG. 16 in that memory block MBd11 includes current switchtransistors SWTc, SWTd, SWTe, SWTf.

Current switch transistor SWTc is electrically coupled between main bitline MBL2 and one end of sub bit line SBL11 that is located closer toread/write control circuit 50. Current switch transistor SWTd iselectrically coupled between main bit line MBL1 and one end of sub bitline /SBL11 that is located closer to read/write control circuit 50.Current switch transistors SWTc, SWTd receive write selection signalsWMB1A, WMB1B at their gates, respectively.

Current switch transistor SWTe is electrically coupled between main bitline MBL1 and the other end of sub bit line SBL11 that is located awayfrom read/write control circuit 50. Current switch transistor SWTf iselectrically coupled between main bit line MBL2 and the other end of subbit line /SBL11 that is located away from read/write control circuit 50.Current switch transistors SWTe, SWTf receive block selection signalsBS1A, BS1B at their gates, respectively.

Hereinafter, data write operation in memory block MBd11 will bedescribed.

When a memory cell connected to sub bit line SBL11 is selected for datawrite operation, block selection signals BS1A and write selection signalWMB1A are activated, and current switch transistors SWTc, SWTe areturned ON. Current switch transistors SWTd, SWTf are turned OFF. As aresult, a data write current ±Iw can be supplied to a current pathformed by main bit line MBL1, current switch transistor SWTe, sub bitline SBL11, current switch transistor SWTc, and main bit line MBL2(/MBL1).

According to the fourth modification of the second embodiment, datawrite magnetic fields are generated by data write current ±Iw flowingthrough main bit line MBL1 and sub bit line SBL11 in the oppositedirections. These data write magnetic fields are applied to the selectedmemory cell.

In the illustrated example, data write magnetic fields are generated bydata write current ±Iw flowing through main bit line MBL2 (/MBL1) andsub bit line /SBL11 in the opposite directions. These data writemagnetic fields are applied to the selected memory cell.

Since the voltages on two main bit lines MBL1, MBL2 of memory blockMBd11 are set in the same manner as that in memory block BMc11 of FIG.16, detailed description thereof will not be repeated.

In the data write operation according to the fourth modification of thesecond embodiment, the selected memory cell is subjected to the datawrite magnetic fields that interact with each other in a constructivemanner in free magnetic layer 104 of tunneling magneto-resistanceelement 100 a, as in the case of FIG. 13.

As a result, in addition to the effects of the third modification of thesecond embodiment, the switching magnetic field strength can begenerated in the free magnetic layer of the tunneling magneto-resistanceelement by a smaller data write current. This enables reduction in powerconsumption.

In data read operation, either block selection signal BS1A or BS1B isselectively activated according to whether the selected memory cellcorresponds to sub bit line SBL11 or /SBL11. Write selection signalsWMB1A, WMB1B are inactivated in data read operation.

Accordingly, in data read operation, current switch transistors SWTc,SWTd are turned OFF. Current switch transistor SWTe, SWTf is selectivelyturned ON according to whether the selected memory cell is located in anodd column or even column.

With the above structure, the selected memory cell is electricallycoupled to one of the two main bit lines corresponding to the memoryblock of the selected memory cell (i.e., the main bit line correspondingto the selected memory cell) through sub bit line SBL or /SBL.

Since no MTJ memory cell is coupled to the other main bit line, dummymemory cell DMC is coupled thereto for the complementary data readoperation, as in the second embodiment. As a result, a read operationmargin is improved. In other words, as shown in FIG. 17, a dummy memorycell that is selected by dummy word line DWL0 is provided for one ofadjacent two main bit lines, and a dummy memory cell that is selected bydummy word line DWL1 is provided for the other main bit line in order toconduct the complementary data read operation.

Fifth Modification of Second Embodiment

In the fifth modification of the second embodiment, each main bit lineMBL is shared by a plurality of memory block columns.

In a memory array 10 of FIG. 19, each pair of main bit lines MBL isshared by two memory block columns. In other words, two main bit linesMBL are provided for four memory cell columns.

Block selection signals BS1 to BLk of FIG. 15 are therefore divided intoblock selection signals BS1A, BS1B, BS1C, BS1D to BSkA, BSkB, BSkC, BSkDindicating the column selection result. The block selection signalindicates which one of the four memory cell columns corresponding to arespective pair of main bit lines is selected.

Similarly, the write selection signals that are activated in data writeoperation are divided into write selection signals WMB1A, WMB1B, WMB1C,WMB1D to WMBkA, WMBkB, WMBkC, WMBkD.

For example, when a memory cell corresponding to sub bit line SBL12 isselected for data write operation in memory block MBd12, block selectionsignals BS1C and write selection signal WMB1C are activated. On theother hand, when a memory cell corresponding to sub bit line /SBL12 isselected for data read operation, only block selection signal BS1D isactivated.

The block selection signal and the write selection signal which areapplied to the gates of current switch transistors SWTc, SWTd, SWTe,SWTf in FIG. 18 are replaced with the block selection signal and thewrite selection signal of FIG. 19 which reflect the column selectionresult (that is, which indicate which one of the four memory cellcolumns is selected). Since memory blocks MBd11 to MBdkm have otherwisethe same structure as that of FIG. 18, detailed description thereof willnot be repeated.

With the above structure, the number of main bit lines MBL in the entirememory array 10 can further be reduced to l (where l is an integerdefined by h/2=m/4). In other words, the required number of main bitlines is half the number of memory cell columns. As a result, the wiringpitch and wiring width (i.e., cross-sectional area) of the main bitlines are assured, whereby current density is suppressed. This preventselectromigration and the like, enabling improvement in operationstability of the MRAM device.

Third Embodiment

In the third embodiment, technology of applying the hierarchical bitline structure in the second embodiment to an MTJ memory cell having astructure other than the two-layer storage node structure in the firstembodiment will be described.

Referring to FIG. 20, an MTJ memory cell MCe having a single-layerstorage node structure includes a tunneling magneto-resistance element100 b and an access transistor ATR. Tunneling magneto-resistance element100 b includes an antiferromagnetic material layer 101, a fixed magneticlayer 102, a free magnetic layer 103, and a tunneling barrier 105.Tunneling magneto-resistance element 100 b has the same structure asthat of the conventional tunneling magneto-resistance element TMR inFIGS. 48 and 49. MTJ memory cell MCe has a single free magnetic layercorresponding to a storage node.

Since access transistor ATR has the same structure as that of MTJ memorycell MTa of FIG. 3, detailed description thereof will not be repeated.Access transistor ATR is electrically coupled to tunnelingmagneto-resistance element 100 b through barrier metal 108 and via hole115.

Free magnetic layer 103 is electrically coupled to bit line BL. Bit lineBL is formed in a metal wiring layer and extends in the columndirection. Write word line WWL is formed in another metal wiring layerand extends in the row direction. A data write magnetic field forchanging the magnetization direction of free magnetic layer 103 isgenerated according to combination of the data write magnetic fieldsrespectively generated by a data write current Ip flowing through writeword line WWL and a data write current ±Iw flowing through bit line BL.

Referring to FIG. 21, a memory cell MCg having a two-layer storage nodestructure includes a tunneling magneto-resistance element 100 c and anaccess transistor ATR.

Tunneling magneto-resistance element 100 c includes an antiferromagneticmaterial layer 101, a fixed magnetic layer 102, free magnetic layers103, 104, a non-magnetic intermediate layer 107 formed between freemagnetic layers 103, 104, and a tunneling barrier 105.

Tunneling magneto-resistance element 100 c has the same structure asthat of the conventional tunneling magneto-resistance element of FIG.51.

Since access transistor ART has the same structure as that in MTJ memorycell MTa of FIG. 3, detailed description thereof will not be repeated.Access transistor ATR is electrically coupled to tunnelingmagneto-resistance element 100 c through barrier metal 108 and via hole115.

Data write operation to memory cell MCg is conducted in the same manneras that described in the “Description of the Background Art” inconnection with FIG. 52.

In the third embodiment, the hierarchical bit line structure is appliedto the memory array including MTJ memory cells MCe or MCf shown in FIGS.20 and 21. Each memory block is shown to include MTJ memory cells MCe inthe third embodiment and modifications thereof. However, each memoryblock may alternatively include MTJ memory cells MCf instead of MTJmemory cells MCe.

FIG. 22 is a circuit diagram of a memory block according to the thirdembodiment.

In the third embodiment, memory blocks MBa11 to MBakm of memory array 10in FIG. 10 are replaced with memory blocks MBe11 to MBekm. Since memoryblocks MBe11 to MBekm have the same structure, FIG. 22 exemplarily showsthe structure of memory block MBe11. Hereinafter, memory blocks MBe11 toMBekm are sometimes generally referred to as memory blocks MBe.

Memory block MBe11 of FIG. 22 is different from memory block MBa11 ofFIG. 11 in that MTJ memory cells MCa are replaced with MTJ memory cellsMCe. Read and write operations from and to MTJ memory cell MCf areconducted in the same manner as that described in connection with FIG.11.

Note that, in the third embodiment and modifications thereof, eachmemory block is shown to have three memory cell rows. However, thepresent invention is not limited to this. Each memory block may have anynumber of memory cell rows equal to or larger than two.

By applying the hierarchical bit line structure, the same effects asthose of the second embodiment can be obtained even for the memory arrayincluding the conventional MTJ memory cells.

First Modification of Third Embodiment

Referring to FIG. 23, in the first modification of the third embodiment,memory blocks MBa11 to MBakm in memory array 10 of FIG. 10 are replacedwith memory blocks MBf11 to MBfkm. Since memory blocks MBf11 to MBfkmhave the same structure, FIG. 23 exemplarily shows the structure ofmemory block MBf11. Hereinafter, memory blocks MBf11 to MBfkm aresometimes generally referred to as memory blocks MBf.

Memory block MBf11 of the first modification of the third embodiment isdifferent from memory block MBb11 of FIG. 12 in that current switchtransistor SWTa is electrically coupled between main bit line MBL1 andone end of sub bit line /SBL11 that is located away from read/writecontrol circuit 50, and in that current switch transistor SWTb iselectrically coupled between main bit line /MBL1 and one end of sub bitline SBL11 that is located away from read/write control circuit 50.Moreover, memory cells MCa are replaced with memory cells MCe.

With the above structure, a data write current ±Iw for data writeoperation is turned back by short-circuit transistor EQT11, and flowsthrough main bit line MBL1 and sub bit line SBL11 in the same direction.Similarly, a data write current ±Iw flows through main bit line /MBL1and sub bit line /SBL11 in the same direction.

Hereinafter, how a data write magnetic field is generated in the memoryblock of FIG. 23 will be described with reference to FIGS. 24A and 24B.

FIG. 24A shows an example in which a data write current +Iw of thepositive direction is supplied to sub bit line SBL (/SBL). In this case,a data write current of the same direction is supplied to acorresponding main bit line MBL (/MBL). Accordingly, the data writemagnetic fields respectively generated by these data write currentsinteract with each other in a constructive manner in free magnetic layer103.

FIG. 24B shows an example in which a data write current −Iw of thenegative direction is supplied to sub bit line SBL (/SBL). In this caseas well, the data write magnetic fields respectively generated by thedata write currents flowing through sub bit line SBL (/SBL) and main bitline MBL (/MBL) interact with each other in a constructive manner infree magnetic layer 103.

As a result, the switching magnetic field strength in free magneticlayer 103 can be obtained with a smaller data write current. Thisenables reduction in power consumption of the MRAM device and reductionin magnetic noise generated for the memory cells other than the selectedmemory cell in data write operation.

By applying the hierarchical bit line structure, increased readoperation speed and reduced power consumption can be realized even inthe conventional MTJ memory cells.

When MTJ memory cells MCf of FIG. 21 having a conventional two-layerstorage node structure are used, a data write magnetic field generatedby the same data write current ±Iw is larger in free magnetic layer 103than in free magnetic layer 104. Therefore, even when free magneticlayers 103, 104 are designed to have the same magnetic moment(magnetization threshold value), free magnetic layer 104 can bemagnetized according to magnetization of free magnetic layer 103. Itshould be noted that, as described in connection with FIG. 51, when freemagnetic layer 103 is designed to have a larger magnetic moment(magnetization threshold value) than that of free magnetic layer 104,magnetization of free magnetic layers 103, 104, that is, the data writeoperation, can be conducted with improved reliability.

Second Modification of Third Embodiment

Referring to FIG. 25, in the second modification of the thirdembodiment, memory blocks MBc11 to MBckm in memory array 10 of FIG. 15are replaced with memory blocks MBg11 to MBgkm. Since memory blocksMBg11 to MBgkm have the same structure, FIG. 25 exemplarily shows thestructure of memory block MBg11. Hereinafter, memory blocks MBg11 toMBgkm are sometimes generally referred to as memory blocks MBg.

Memory block MBg11 in the second modification of the third embodimenthas the same structure as that of memory block MBc11 of FIG. 16 exceptthat memory cells MCa are replaced with memory cells MCf. Sub bit linesSBL11, /SBL11 are arranged according to the open bit line structure. Ineach memory cell column, MTJ memory cell MTe is provided in every memorycell row.

Since connection and ON/OFF conditions of current switch transistorsSWTa, SWTb, SWTc, SWTd are the same as those described in connectionwith FIG. 16, detailed description thereof will not be repeated.

With the above structure, the same effects as those of the thirdmodification of the second embodiment can be obtained even in the memoryarray having the conventional MTJ memory cells arranged according to theopen bit line structure.

Third Modification of Third Embodiment

Referring to FIG. 26, in the third modification of the third embodiment,memory blocks MBc11 to MBckm in memory array 10 of FIG. 15 are replacedwith memory blocks MBh11 to MBhkm. Since memory blocks MBh11 to MBhkmhave the same structure, FIG. 26 exemplarily shows the structure ofmemory block MBh11. Hereinafter, memory blocks MBh11 to MBhkm aresometimes generally referred to as memory blocks MBh.

Memory block MBh11 in the third modification of the third embodiment isdifferent from memory block MBg11 of FIG. 25 in that current switchtransistors SWTa, SWTb are replaced with current switch transistorsSWTe, SWTf.

Current switch transistor SWTe is electrically coupled between main bitline MBL1 and one end of sub bit line SBL11 that is located closer toread/write control circuit 50. Current switch transistor SWTf iselectrically coupled between main bit line /MBL1 and one end of sub bitline /SBL11 that is located closer to read/write control circuit 50.Current switch transistors SWTe, SWTf respectively receive blockselection signals BS1A, BS1B at their gates.

With the above structure, a data write current ±Iw having the samedirection as that of main bit line MBL1 can be supplied to sub bit lineSBL11 by turning ON current switch transistors SWTc, SWTe. On the otherhand, a data write current ±Iw having the same direction as that of mainbit line MBL2 (/MBL1) can be supplied to sub bit line /SBL11 by turningON current switch transistors SWTd, SWTf.

In data read operation, current switch transistors SWTc, SWTd are turnedOFF, and one of current switch transistors SWTe, SWTf that correspondsto the selected memory cell is turned ON. As in memory block MBd11 ofFIG. 18, one of the pair of main bit lines that is not electricallycoupled to the selected memory cell is coupled to a dummy memory cell inorder to conduct complementary data read operation.

According to the third and its modifications embodiment by applying thehierarchical bit line structure, data write and read operations can beconducted even in the memory array including the conventional MTJ memorycells. In particular, the data write magnetic fields respectivelygenerated by the data write currents flowing through the main bit lineand the sub bit line interact with each other in a constructive mannerin the free magnetic layer. This enables reduction in data writecurrent, and thus enables reduction in magnetic noise and powerconsumption.

Fourth Embodiment

In the fourth embodiment, another structural example of the MTJ memorycell having a two-layer storage node structure described in the firstembodiment will be described.

Referring to FIG. 27, an MTJ memory cell MTg having a two-layer storagenode structure according to the fourth embodiment includes a tunnelingmagneto-resistance element 100 d and an access transistor ATR. Tunnelingmagneto-resistance element 100 d includes an antiferromagnetic materiallayer 101, a fixed magnetic layer 102, free magnetic layers 103, 104, atunneling barrier 105 and an intermediate layer 107.

In the fourth embodiment, intermediate layer 107 extends in the rowdirection and forms write word line WWL. Bit line BL extends in thecolumn direction and is formed in a metal wiring layer located above orbelow tunneling magneto-resistance element 100 d. In the example of FIG.27, bit line BL is formed in a layer located above tunnelingmagneto-resistance element 100 d.

Access transistor ATR is electrically coupled between tunnelingmagneto-resistance element 100 d and bit line BL. Read word line RWLextending in the row direction is formed at the gate of accesstransistor ATR.

Hereinafter, how a data write magnetic field is generated in MTJ memorycell MCg will be described with reference to FIGS. 28A and 28B. FIGS.28A and 28B correspond to a cross-sectional view taken along line R-S ofFIG. 27.

In the example of FIG. 28A, a data write current +Iw of the positivedirection is supplied to bit line BL. In the example of FIG. 28B, a datawrite current −Iw of the negative direction is supplied to bit line BL.In both examples of FIGS. 28A and 28B, a data write current Ip flowsthrough intermediate layer 107 (write word line WWL) in a fixeddirection.

Free magnetic layers 103, 104 are magnetized in the hard-axis (HA)direction by data write current Ip flowing through intermediate layer107. With this structure, the amount of data write current required togenerate a data write magnetic field of the hard-axis (HA) direction infree magnetic layers 103, 104 can be reduced. This enables reduction inpower consumption and magnetic noise in the MRAM device.

Free magnetic layers 103, 104 are magnetized in the easy-axis (EA)direction by a data write current ±Iw flowing through bit line BL.

In tunneling magneto-resistance element 100 d, a magnetic field of theeasy-axis (EA) direction generated by the data write current flowingthrough bit line BL is superimposed on a magnetic field of the hard-axis(HA) direction generated by the data write current flowing throughintermediate layer 107 (write word line WWL), whereby data writeoperation is conducted. In other words, in order that data writeoperation involving inversion of the magnetization direction isconducted only to the memory cell subjected to the magnetic fieldresulting from superimposition of the above two magnetic fields, freemagnetic layers 103, 104 must be formed from different materials andwith different thicknesses so as to have different magnetic moments(magnetization threshold values).

Referring to FIG. 29, memory array 10 includes MTJ memory cells MCghaving a two-layer storage node structure. MTJ memory cells MCg arearranged in n rows by m columns (where n, m is a natural number). Memorycell MCg includes an access transistor ATR and a tunnelingmagneto-resistance element 100 d.

Read word lines RWL1 to RWLn and write word lines WWL1 to WWLn arearranged respectively corresponding to the memory cell rows. Bit linesBL1 to BLm are arranged respectively corresponding to the memory cellcolumns.

Word line current control circuit 40 couples each write word line WWL toground voltage VSS in the region facing word line driver 30 with memoryarray 10 interposed therebetween. This enables a data write current Ipof a fixed direction to be supplied to the write word line that isselectively coupled to power supply voltage VDD by word line driver 30.

FIG. 29 exemplarily shows read word lines RWL1, RWLn, write word linesWWL1, WWLn, bit lines BL1, BLm−1, BLm corresponding to the first andn^(th) rows and the first, (m−1)^(th) and m^(th) columns, and some ofcorresponding memory cells.

In data read operation, intermediate layer 107, that is, write word lineWWL, is fixed to ground voltage VSS. By selectively activating read wordline RWL corresponding to the selected memory cell, tunnelingmagneto-resistance element 100 d is electrically coupled between acorresponding bit line BL and ground voltage VSS. The storage data canbe read from the selected memory cell by sensing a voltage change on bitline BL coupled to the selected memory cell.

Intermediate layer 107 is formed from a non-magnetic conductor betweenfree magnetic layers 103, 104. The shape and electric characteristics ofintermediate layer 107 can be arbitrarily determined. In the fourthembodiment, write word line WWL is formed using intermediate layer 107.Therefore, intermediate layer 107 extends in the column direction with astripe shape so that intermediate layers 107 of the MTJ memory cells ofthe same memory cell column are electrically coupled to each other.

First Modification of Fourth Embodiment

Referring to FIG. 30, in the memory array of the first modification ofthe fourth embodiment, write word lines WWL are arranged in ahierarchical manner. More specifically, main write word lines MWWL1 toMWWLn are additionally provided corresponding to the respective memorycell rows. Hereinafter, main write word lines MWWL1 to MWWLn aresometimes generally referred to as main write word lines MWWL.

In a memory cell MCh of the fourth embodiment, write word line WWL isformed using intermediate layer 107 of tunneling magneto-resistanceelement 100 d. Therefore, write word line WWL has a relatively highelectric resistance value. Main write word line MWWL1 to MWWLn is formedusing a metal wiring layer located above tunneling magneto-resistanceelement 100 d.

In each memory cell row, main write word line MWWL and write word lineWWL are electrically coupled to each other at their respective one endsin the region opposite to word line driver 30 (word line current controlcircuit 40). Each write word line WWL, that is, intermediate layer 107,is electrically coupled to ground voltage VSS at its one end located atword line driver 30. In data write operation, word line driver 30couples main write word line MWWL corresponding to the selected memorycell to power supply voltage VDD according to the row selection result.

With the above structure, a data write current Ip can be supplied tomain write word line MWWL and write word line WWL of the memory cell rowcorresponding to the selected memory cell in the opposite directions.The data write currents flowing through main write word line MWWL andwrite word line WWL respectively generate magnetic fields of thehard-axis (HA) direction in the free magnetic layers of the selectedmemory cell. These magnetic fields interact with each other in aconstructive manner. As a result, data write current Ip can further besuppressed.

A data write current ±Iw having the direction according to the writedata level DIN is supplied to bit line BL of the memory cell columncorresponding to the selected memory cell, whereby data can be writtento the selected memory cell.

In data read operation, each main write word line MWWL and each writeword line WWL are set to ground voltage VSS and read word line RWLcorresponding to the selected memory cell is activated. As a result,tunneling magneto-resistance element 100 d of the selected memory cellis electrically coupled between a corresponding bit line BL and groundvoltage VSS.

Second Modification of Fourth Embodiment

Referring to FIG. 31, each memory cell row is divided into prescribedregions, and write word line WWL of each memory cell row is divided intosub write word lines corresponding to the respective prescribed regions.For example, write word line WWL1 of the first memory cell row isdivided into k sub write word lines SWWL11 to SWWL1k (where k is anatural number). Similarly, write word line WWL of the n^(th) memorycell row is divided into k sub write word lines SWWLn1 to SWWLnk.Hereinafter, sub write word lines SWWL11 to SWWLnk are sometimesgenerally referred to as sub write word lines SWWL. Sub word selectionsignals SW1 to SWk are defined as signals corresponding to therespective prescribed regions of sub write word lines SWWL.

The hierarchical word line structure of main write word line MWWL andsub write word line SWWL is thus applied to each memory cell row. Likethe first modification of the fourth embodiment, each sub write wordline SWWL is formed using intermediate layer 107 of tunnelingmagneto-resistance element 100 d.

This enables reduction in wiring length of sub write word line SWWL thatis formed in a thin intermediate layer having a relatively high electricresistance value per unit resistance, and thus enables reduction inelectric resistance value of sub write word line SWWL.

Main write word line MWWL1 to MWWLn is selectively coupled to powersupply voltage VDD by a corresponding main word driver MWD1 to MWDn inword line driver 30. Sub word drivers SWD11 to SWDnk are respectivelyprovided for sub write word lines SWWL11 to SWWLnk. Hereinafter, subword drivers SWD11 to SWDnk are sometimes generally referred to as subword drivers SWD.

Each sub word driver SWD11 to SWDnk couples one end of a correspondingsub write word line SWWL to power supply voltage VDD in response toactivation of both a corresponding main write word line MWWL and acorresponding sub word selection signal SWi (where i is an integer inthe range of 1 to k). Each sub word driver SWD11 to SWDnk thus activatesa corresponding sub write word line SWWL.

For example, sub word driver SWD may be formed from a switching elementthat is connected between a corresponding main write word line MWWL andone end of a corresponding sub write word line SWWL and turned ON/OFF inresponse to a corresponding sub word selection signal SWi. The other endof sub write word line SWWL that is not connected to sub word driver SWDis coupled to ground voltage VSS.

Sub word drivers SWD are arranged so that the data write magnetic fieldsrespectively generated by a data write current Ip flowing through mainwrite word line MWWL and a data write current Ip flowing through subwrite word line SWWL interact with each other in the free magneticlayers of the selected memory cell.

More specifically, in FIG. 31, each sub word driver SWD is arranged atone end of a corresponding sub write word line SWWL that is located awayfrom a corresponding main word driver MWD. The other end of sub writeword line SWWL that is located closer to main word driver MWD iselectrically coupled to ground voltage VSS.

With the above structure, a data write current Ip for generating arequired magnetic field of the hard-axis (HA) direction can besuppressed in the MTJ memory cell of the fourth embodiment. Moreover,the electric resistance value of the write word line can be reduced ascompared to the case where the write word line is formed using anintermediate layer extending in the row direction in the entire memoryarray 10. This enables high-speed operation.

Third Modification of Fourth Embodiment

Referring to FIG. 32, in the third modification of the fourthembodiment, write word lines WWL are arranged in a hierarchical mannerby using main write word lines MWWL and sub write word lines SWWL, as inthe second modification of the fourth embodiment. Read word lines RWLare divided in the same manner as that of the write word lines. Forexample, read word line RWL1 corresponding to the first memory cell rowis divided into sub read word lines SRWL11 to SRWL1k respectivelycorresponding to sub write word lines SWWL11 to SWWL1k.

As described before, read word line RWL is formed from a relatively highresistance material such as polysilicon by using a gate electrode layerof access transistor ATR. By providing sub read word lines SRWL having areduced wiring length in each memory cell row, the electric resistancevalue of each sub read word line SRWL can be reduced.

Sub read drivers SRD11 to SRD1k respectively correspond to sub readwordlines SRWL11 to SRWL1k. Hereinafter, sub read drivers SRD11 to SRD1kare sometimes generally referred to as sub read drivers SRD. Sub readdriver SRD may be formed from a switching element that is connectedbetween a corresponding main write word line MWWL and one end of acorresponding sub read word line SRWL and turned ON in response toactivation of a corresponding sub word selection signal SWi in data readoperation.

Main word driver MWD1 to MWDn selectively activates a corresponding mainwrite word line MWWL corresponding to the selected memory cell in bothdata read and write operations.

With the above structure, in data write operation, a data write currentIp can be supplied to both main write word line MWWL and sub write wordline SWWL to generate data write magnetic fields, as in the case of FIG.31. Accordingly, the same effects as those of the modification of thethird embodiment in FIG. 31 can be obtained in data write operation.

In data read operation, a sub read word line SRWL corresponding to theselected memory cell is activated in response to activation of acorresponding main write word line MWWL and turning-ON of acorresponding sub read driver SRD. As a result, data can be read fromthe selected memory cell.

Sub read word line SRWL is activated through main write word line MWWLformed as a metal wiring having a low electric resistance value.Accordingly, sub read word line SRWL corresponding to the selectedmemory cell can be rapidly activated. In other words, a signal can bepropagated trough sub read word line SRWL with reduced time in data readoperation, enabling high-speed data read operation.

Fifth Embodiment

In the first to fourth embodiments, write word line WWL or bit line BLis formed using an intermediate layer that extends in the row or columndirection between two free magnetic layers. In the fifth embodiment, thestructure capable of supplying a data write current only to theintermediate layer of the selected memory cell will be described. Thisstructure is realized by forming an independent intermediate layer inevery memory cell.

Referring to FIG. 33, MTJ memory cells MCp of the fifth embodiment arearranged in n rows by m columns in the entire memory array 10. Each MTJmemory cell MCp includes a tunneling magneto-resistance element 100 aand access transistors ATRr, ATRw as access elements.

Read word lines RWL1 to RWLn and write word lines WWL1 to WWLn arearranged corresponding to the respective memory cell rows. Write rowselection lines WRSL1 to WRSLn are additionally arranged correspondingto the respective memory cell rows. Hereinafter, write row selectionlines WRS1 to WRSLn are sometimes generally referred to as write rowselection lines WRSL.

Bit lines BL, /BL are arranged corresponding to the respective memorycell columns. Accordingly, read word lines RWL1 to RWLn, write wordlines WWL1 to WWLn, write row selection lines WRSL1 to WRSLn and bitlines BL1 to BLm, /BL1 to /BLm are arranged in the entire memory array10.

In data write operation, write row selection line WRSL of the selectedrow is activated to H level. Word line driver 30 is thus capable ofdriving write row selection line WRSL according to the same decoderesult as that of a corresponding write word line WWL. Although a datawrite current Ip is supplied to write word line WWL of the selected row,a current is not actively supplied to write row selection line WRSL.This is because write row selection line WRSL is provided in order tocontrol the gate voltage of a corresponding access transistor ATRw.

In each MTJ memory cell MCp, tunneling magneto-resistance element 100 ais electrically coupled to a corresponding bit line /BL. Accesstransistors ATRr, ATRw are electrically coupled between a correspondingbit line BL and tunneling magneto-resistance element 100 a. The gatevoltage of access transistor ATRr is controlled by a corresponding readword line RWL, and the gate voltage of access transistor ATRw iscontrolled by a corresponding write row selection line WRSL.

Referring to FIG. 34, in the fifth embodiment, intermediate layer 107 isformed from a non-magnetic conductor, and every MTJ memory cell MCp hasan independent intermediate layer 107. One end of intermediate layer 107is electrically coupled to a corresponding bit line /BL. The other endof intermediate layer 107 is electrically coupled to a corresponding bitline BL through access transistor ATRw. In other words, accesstransistor ATRw is connected in series with intermediate layer 107between corresponding bit lines BL, /BL, and serves to selectivelysupply a data write current to intermediate layer 107.

Data write operation to tunneling magneto-resistance element 100 a isconducted in the same manner as that described in connection with FIGS.4A and 4B. More specifically, by controlling the voltages at both endsof intermediate layer 107, a data write current +Iw or −Iw is suppliedto intermediate layer 107 according to the write data level. Freemagnetic layers 103, 104 can thus be magnetized according to the writedata level.

Access transistor ATRr is provided between antiferromagnetic materiallayer 101 and a corresponding bit line BL. A write row selection lineWRSL and a read word line RWL are respectively connected to the gates ofaccess transistors ATRw, ATRr.

Referring to FIG. 35, in data read operation, word line driver 30activates read word line RWL of the selected row from L level to Hlevel. In response to this, access transistor ATRr of the selected rowis turned ON. Since the voltages on each write row selection line WRSLand each write word line WWL are retained at L level (ground voltageVSS), each access transistor ATRw is turned OFF.

Read/write control circuits 50, 60 couple bit line /BL to ground voltageVSS and supply a sense current (data read current) Is to bit line BL.Turned-ON access transistor ATRr allows tunneling magneto-resistanceelement 100 a of the selected memory cell to be electrically coupledbetween bit line BL receiving sense current Is and ground voltage VSS.As a result, the voltage on bit line BL changes according to the storagedata of the selected MTJ memory cell. The storage data can be read fromthe selected MTJ memory cell by sensing the voltage on bit line BL.

In data write operation, word line driver 30 activates write rowselection line WRSL and write word line WWL of the selected row to Hlevel (power supply voltage VCC). As a result, a data write current Ipis supplied to write word line WWL of the selected row, and accesstransistor ATRw of the selected row is turned ON.

Read/write control circuits 50, 60 set one of bit lines BL, /BL of theselected column to one of power supply voltage VCC and ground voltageVSS, and the other bit line to the other voltage. For example, in orderto write data “1”, read/write control circuits 50, 60 set bit line BL topower supply voltage VCC and bit line /BL to ground voltage VSS so as tosupply a data write current +Iw to intermediate layer 107. On the otherhand, in order to write data “0”, read/write control circuits 50, 60 setbit line /BL to power supply voltage VCC and bit line BL to groundvoltage VSS so as to supply a data write current −Iw to intermediatelayer 107. Bit lines BL, /BL of the non-selected columns are set toground voltage VSS.

In data write operation, a data write current is thus supplied only tointermediate layer 107 of the selected memory cell. Even if anon-selected memory cell is located on the same memory cell column orthe same memory cell row as that of the selected memory cell, a datawrite current ±Iw will not be supplied to intermediate layer 107 of thenon-selected memory cell. Bit lines BL, /BL are located away from thetunneling magneto-resistance element. Therefore, in the fifthembodiment, data can be prevented from being erroneously written to thenon-selected memory cells.

First Modification of Fifth Embodiment

Referring to FIG. 36, in the first modification of the fifth embodiment,MTJ memory cells MCq are arranged in n rows by m columns in the entirememory array 10. Each MTJ memory cell MCq includes a tunnelingmagneto-resistance element 100 a coupled to a corresponding bit line BL,an access transistor ATRw provided between a corresponding bit line /BLand tunneling magneto-resistance element 100 a, and an access transistorATRr provided between tunneling magneto-resistance element 100 a andground voltage VSS. The gate voltage of access transistor ATRr iscontrolled by a corresponding read word line RWL and the gate voltage ofaccess transistor ATRw is controlled by a corresponding write rowselection line WRSL.

Since read word lines RWL, write word lines WWL, write row selectionlines WRSL and bit lines BL, /BL are arranged in the same manner as thatin the fifth embodiment, detailed description thereof will not berepeated.

Referring to FIG. 37, in the first modification of the fifth embodiment,every MTJ memory cell MCq includes an independent intermediate layer107. One end of intermediate layer 107 is coupled to a corresponding bitline BL, and the other end thereof is connected to a corresponding bitline /BL through access transistor ATRw. Accordingly, as in the fifthembodiment, access transistor ATRw is connected in series withintermediate layer 107 between corresponding bit lines BL, /BL, andserves to selectively supply a data write current to intermediate layer107. Access transistor ATRr is connected between antiferromagneticmaterial layer 101 and ground voltage VSS.

Access transistor ATRw is turned ON when a corresponding write rowselection line WRSL is set to H level (power supply voltage VCC), andturned OFF when the corresponding write row selection line WRSL is setto L level (ground voltage VSS). Similarly, access transistor ATRr isturned ON when a corresponding read word line RWL is set to H level(power supply voltage VCC), and turned OFF when the corresponding readword line RWL is set to L level (ground voltage VSS).

In the first modification of the fifth embodiment, the respectiveoperating waveforms of read word line RWL, write word line WWL, writerow selection line WRSL and bit lines /BL, BL in data read and writeoperations are the same as those shown in FIG. 35. In other words, inthe first modification of the fifth embodiment as well, the voltage andcurrent on read write word line RWL, write word line WWL, write rowselection line WRSL and bit lines /BL, BL are controlled in the samemanner as that of the fifth embodiment in order to conduct data read andwrite operations. In data write operation, a data write current ±Iw issupplied only to intermediate layer 107 of the selected memory cell asin the case of the fifth embodiment. The data can thus be prevented frombeing erroneously written to the non-selected memory cells.

Second Modification of Fifth Embodiment

Referring to FIG. 38, in the second modification of the fifthembodiment, MTJ memory cells MCr are arranged in n rows by m columns inthe entire memory array 10. Each MTJ memory cell MCr includes atunneling magneto-resistance element 100 a coupled to a correspondingbit line /BL, an access transistor ATRw electrically coupled between acorresponding bit line BL and tunneling magneto-resistance element 100a, and an access diode ADr as an access element coupled between acorresponding read word line RWL and tunneling magneto-resistanceelement 100 a. The forward direction of access diode ADr is thedirection from read word line RWL toward tunneling magneto-resistanceelement 100 a.

Since read word lines RWL, write word lines WWL, write row selectionlines WRSL and bit lines BL, /BL are arranged in the same manner as thatof the fifth embodiment, detailed description thereof will not berepeated.

Referring to FIG. 39, MTJ memory cell MCr in the second modification ofthe fifth embodiment is different from MTJ memory cell MCp in the fifthembodiment shown in FIG. 34 in that access transistor ATRr is replacedwith access diode ADr. Access diode ADr is electrically coupled betweena corresponding read word line RWL and antiferromagnetic material layer101, and the forward direction of access transistor ADr is the directionfrom read word line RWL toward antiferromagnetic material layer 101.Since the structure of MTJ memory cell MCr is otherwise the same as thatof MTJ memory cell MCp of the fifth embodiment, detailed descriptionthereof will not be repeated.

Referring to FIG. 40, in data read operation, word line driver 30activates a read word line RWL of the selected row from L level to Hlevel (power supply voltage VCC). Read/write control circuits 50, 60connect bit line /BL to ground voltage VSS in order to supply a sensecurrent (data read current) −Is of the negative direction thereto. As aresult, access diode ADr of the selected row is forward-biased andturned ON.

On the other hand, each write row selection line WRSL and each writeword line WWL are retained at L level (ground voltage VSS). Therefore,each access transistor ARTw is turned OFF. Read/write control circuits50, 60 set bit line BL to ground voltage VSS.

Turned-ON access diode ADr allows the sense current to be supplied totunneling magneto-resistance element 100 a of the selected memory cell.As a result, data can be read from the selected MTJ memory cell bysensing the voltage on bit line BL.

Read word lines RWL of the non-selected rows are retained at L level(ground voltage VSS). Therefore, corresponding access diodes ADr willnot be forward biased, and are retained in OFF state.

Since the operating waveforms in data write operation are the same asthose shown in FIG. 35, detailed description thereof will not berepeated. In the second modification of the fifth embodiment, a datawrite current is supplied only to the intermediate layer of the selectedmemory cell in data write operation. Accordingly, as in the fifthembodiment and the first modification thereof, data can be preventedfrom being erroneously written to the non-selected memory cells.Moreover, using a diode as an access element instead of an accesstransistor enables reduction in size of the MTJ memory cell.

Third Modification of Fifth Embodiment

Referring to FIG. 41, in the third modification of the fifth embodiment,MTJ memory cells MCs are arranged in n rows by m columns in the entirememory array 10. Each MTJ memory cell MCs includes a tunnelingmagneto-resistance element 100 a coupled to a corresponding bit line BL,an access transistor ATRw electrically coupled between a correspondingbit line /BL and tunneling magneto-resistance element 100 a, and anaccess diode ADr as an access element coupled between a correspondingread word line RWL and tunneling magneto-resistance element 100 a. Theforward direction of access diode ADr is the direction from read wordline RWL toward tunneling magneto-resistance element 100 a. Since readword lines RWL, write word lines WWL, write row selection lines WRSL andbit lines BL, /BL are arranged in the same manner as that of the fifthembodiment, detailed description thereof will not be repeated.

Referring to FIG. 42, MTJ memory cell MCs of the third modification ofthe fifth embodiment is different from MTJ memory cell MCr of the fifthembodiment shown in FIG. 39 in that access transistor ATRw is providedbetween intermediate layer 107 and bit line /BL. Intermediate layer 107is electrically coupled to bit line BL. Since the structure of MTJmemory cell MCs is otherwise the same as that of MTJ memory cell MCr ofthe second modification of the fifth embodiment, detailed descriptionthereof will not be repeated.

Referring to FIG. 43, data write and read operations in the thirdmodification of the fifth embodiment are different from those of thesecond modification of the fifth embodiment shown in FIG. 40 in that thevoltages on bit lines BL, /BL are switched each other. Since the datawrite and read operations of the third modification of the fifthembodiment are otherwise the same as those of the second modification ofthe fifth embodiment, detailed description thereof will not be repeated.

In the third modification of the fifth embodiment as well, a diode isused as an access element as in the second modification of the fifthembodiment. This enables reduction in size of the MTJ memory cell.

Sixth Embodiment

In the structure described in the sixth embodiment, symmetricmagnetization characteristics of the MTJ memory cell can be obtainedindependently of the write data level.

As can be seen from the following description, the structure of thesixth embodiment can be applied to any of tunneling magneto-resistanceelements 100 a, 100 b and 100 c described in the first to fifthembodiments. Accordingly, in the sixth embodiment, these tunnelingmagneto-resistance elements are generally referred to as tunnelingmagneto-resistance element 100. The free magnetic layers in each type oftunneling magneto-resistance element are generally referred to as freemagnetic layer VL.

Referring to FIG. 44, in data write operation, data write magneticfields H(BL) and H(WWL) are applied to tunneling magneto-resistanceelement 100. Data write magnetic field H(BL) is generated by a datawrite current ±Iw flowing through bit line BL, and data write magneticfield H(WWL) is generated by a data write current Ip flowing throughwrite word line WWL. Free magnetic layer VL in tunnelingmagneto-resistance element 100 is subjected to a coupling magnetic fieldΔHp of the easy-axis (EA) direction that results from magnetostaticcoupling with a magnetic field of the fixed magnetic layer.

Data write magnetic field H(BL) mainly includes a component along theeasy-axis (EA) direction of free magnetic layer VL, and data writemagnetic field H(WWL) mainly includes a component along the hard-axis(HA) direction of free magnetic layer VL. In other words, data writemagnetic field H(BL) is applied to magnetize free magnetic layer VL inthe easy-axis (EA) direction, and data write magnetic field H(WWL) isapplied to magnetize free magnetic layer VL in the hard-axis (HA)direction.

In the sixth embodiment, data write magnetic field H(WWL) is not appliedin the direction exactly in parallel with the hard axis HA of freemagnetic layer VL, but at a prescribed angle α with the hard axis HA.Accordingly, data write magnetic field H(WWL) is decomposed into acomponent HWWL(e) of the easy-axis (EA) direction and a componentHWWL(h) of the hard-axis (HA) direction.

These components are defined by the following expressions (1) and (2):HWWL(e)=H(WWL)·sin α  (1); andHWWL(h)=H(WWL)·cos α  (2).

Prescribed angle α is set so as to satisfy the following expression (3):H(WWL)·sin α+ΔHp=0  (3).

Uniform coupling magnetic field ΔHp is thus cancelled by the componentof H(WWL) along the easy-axis (EA) direction. In other words, data writemagnetic field H(WWL) includes a component of the direction that cancelscoupling magnetic field ΔHp.

In the sixth embodiment, data write magnetic field H(BL) is appliedalong the easy axis (EA) in the direction according to the write datalevel. As a result, magnetization along the easy-axis (EA) direction isrealized by data write magnetic field H(BL) alone.

With the above structure, symmetric magnetization characteristics can beobtained along the easy-axis (EA) direction independently of the writedata level, that is, the direction of data write current ±Iw. Thisenables suppression of data write current ±Iw required for data writeoperation, and thus enables reduction in power consumption of the MRAMdevice and current density of bit line BL. As a result, operationreliability of the MRAM device is improved.

Note that, for magnetization along the hard-axis (HA) direction,prescribed angle α is required to satisfy the following expression (4):H(WWL)·cos α>HSWh  (4)

Note that HSWh indicates a magnetization threshold value in themagnetization characteristics along the hard-axis (HA) direction, andcorresponds to a value along the ordinate in the asteroid characteristicline shown in FIG. 50.

Referring to FIG. 45, in order to realize the relation between themagnetic fields shown in FIG. 44, bit line BL extends in the directionperpendicular to the easy axis (EA) of free magnetic layer VL. Whentunneling magneto-resistance element 100 (free magnetic layer VL) has arectangular shape, the easy axis (EA) corresponds to the direction alongthe longer side of the rectangular.

On the other hand, write word line WWL extends at prescribed angle αwith the easy axis (EA). In other words, write word line WWL and bitline BL do not extend perpendicularly to each other, but extend at anangle of (90−α) degrees.

The arrangement of FIG. 45 can be implemented by appropriately designingthe respective formation patterns and polishing patterns (e.g.,polishing patterns by CMP (Chemical Mechanical Polishing)) of at leastfree magnetic layer VL of tunneling magneto-resistance element 100 andmetal wiring layers of write word line WWL and bit line BL. Thisarrangement enables the data write magnetic fields of the sixthembodiment shown in FIG. 44 to be applied to the MTJ memory cell.

Modification of Sixth Embodiment

In the structure described in the modification of the sixth embodiment,bit line BL and write word line WWL extend perpendicularly to each otherand the same effects as those of the sixth embodiment can be obtained.

Referring to FIG. 46, in the modification of the sixth embodiment,tunneling magneto-resistance element 100 is arranged so that data writemagnetic field H(BL) is applied at a prescribed angle α with theeasy-axis (EA) direction of free magnetic layer VL. Data write magneticfields H(WWL), H(BL) are applied in the directions perpendicular to eachother. In other words, bit line BL and write word line WWL extendperpendicularly to each other. Accordingly, as in the sixth embodiment,data write magnetic field H(WWL) is applied at a prescribed angle α withthe hard-axis (HA) direction of free magnetic layer VL. Data writemagnetic field H(BL) is applied in one of the opposite (antiparallel)directions according to the write data level.

A magnetic field H(e) applied to tunneling magneto-resistance element100 (free magnetic layer VL) in the easy-axis (EA) direction istherefore defined by the following expression (5):H(e)=H(WWL)·sin α±H(BL)·cos α+ΔHp  (5).

The same effects as those of the sixth embodiment can be obtained bysetting prescribed angle α so as to satisfy the above expression (3) asin the sixth embodiment.

Similarly, a magnetic field H(h) applied to tunneling magneto-resistanceelement 100 (free magnetic layer VL) in the hard-axis (HA) direction isdefined by the following expression (6):H(h)=H(WWL)·cos α±H(BL)·sin α  (6).

In order to rewrite the magnetization direction of free magnetic layerVL in the selected MTJ memory cell, the following expressions (7) and(8) must be satisfied:|±H(BL)·cos α|>HSWe  (7); and|H(WWL)·cos α±H(BL)·sin α|>HSWh  (8).

Note that HSWh and HSWe are threshold values for magnetization in thehard-axis (HA) and easy-axis (EA) directions, and correspond to valuesalong the ordinate and abscissa of the asteroid characteristic lineshown in FIG. 50, respectively.

Prescribed angle α and data write magnetic fields H(WWL), H(BL) needonly be set so as to satisfy the above expressions. Note that, as can beseen from the above expression (8), in the structure of the modificationof the sixth embodiment, H(WWL) must have a larger value than that inthe normal structure (i.e., the structure where prescribed angle α iszero) in order to obtain symmetric magnetization characteristics alongthe easy-axis (EA) direction. In other words, a larger data writecurrent Ip must be supplied to write word line WWL.

Accordingly, in the structure of the modification of the sixthembodiment, current consumption can be suppressed in the case where datawrite currents Ip and ±Iw required for data write operation satisfy therelation: Ip<|±Iw|. For example, this case corresponds to the structureof writing data in parallel to a plurality of memory cell columns alonga single selected row in each data write operation.

Typically, data write operation according to the above structure iseffective in the MRAM device that is applied to a system LSI (LargeScale Integrated circuit) integrated on the same semiconductor chip asthat of a logic such as a processor and required to receive and outputmulti-bit data in parallel from and to other circuits in order toimplement high-speed data processing with low power consumption.

Referring to FIG. 47, in order to realize the relation between themagnetic fields shown in FIG. 46, write word line WWL extends atprescribed angle α with the easy-axis (EA) direction of tunnelingmagneto-resistance element 100 (free magnetic layer VL). When tunnelingmagneto-resistance element 100 has an elongated shape such as arectangular shape, write word line WWL extends at prescribed angle αwith the direction along the longer side of tunneling magneto-resistanceelement 100. Moreover, bit line BL and write word line WWL extendperpendicularly to each other.

This arrangement can also be realized by appropriately designing therespective formation patterns and polishing patterns of the magneticlayers and metal wiring layers. This arrangement enables the data writemagnetic fields of the modification of the sixth embodiment shown inFIG. 46 to be applied to the MTJ memory cell.

Although the present invention has been described and illustrated indetail, it is clearly understood that the same is by way of illustrationand example only and is not to be taken by way of limitation, the spritand scope of the present invention being limited only by the terms ofthe appended claims.

1. A thin film magnetic memory device, comprising: a plurality of memorycells for storing data, wherein each memory cell includes a magneticstorage portion having an electric resistance value varying according toa magnetization direction that is rewritten in response to an appliedmagnetic field, and an access element for supplying a data read currentto said magnetic storage portion in a data read operation, said thinfilm magnetic memory device further comprising: a global data line and alocal data line that are arranged in a hierarchical manner, for passingtherethrough a data write current for magnetizing said magnetic storageportion in a direction according to write data in a data writeoperation, wherein said plurality of memory cells are arranged in amatrix, said global data line is provided corresponding to one of everymemory cell row and every memory cell column, and said local data lineis provided for every prescribed segment of a memory cell groupcorresponding to a same global data line, said thin film magnetic memorydevice further comprising: a data write circuit for setting one end ofone of a pair of global data lines to a first voltage and one end of theother global data line to a second voltage according to a write datalevel in data write operation; a first current switch portion providedfor every pair of local data lines, for electrically coupling respectiveone ends of a corresponding pair of local data lines to each other insaid data write operation; and a second current switch portion providedfor every pair of local data lines, for connecting the other ends ofsaid corresponding pair of local data lines to corresponding two globaldata lines, respectively.
 2. A thin film magnetic memory device,comprising: a plurality of memory cells for storing data, wherein eachmemory cell includes a magnetic storage portion having an electricresistance value varying according to a magnetization direction that isrewritten in response to an applied magnetic field, and an accesselement for supplying a data read current to said magnetic storageportion in a data read operation, said thin film magnetic memory devicefurther comprising: a global data line and a local data line that arearranged in a hierarchical manner, for passing therethrough a data writecurrent for magnetizing said magnetic storage portion in a directionaccording to write data in a data write operation; a data read circuitfor supplying said data read current to be supplied to said magneticstorage portion corresponding to a memory cell selected for said dataread operation to each of a pair of global data lines in said data readoperation and producing read data based on voltage comparison betweensaid pair of global data lines; and a reference voltage generatingportion provided for every global data line, for generating a referencevoltage in response to passage of said data read current, wherein amemory cell selected for said data read operation is electricallyconnected to a corresponding global data line through a correspondinglocal data line and receives said data read current, and in said dataread operation, a global data line that forms a pair with a global dataline corresponding to said selected memory cell is connected to saidreference voltage generating portion.
 3. A thin film magnetic memorydevice, comprising: a plurality of memory cells for storing data,wherein each memory cell includes a magnetic storage portion having anelectric resistance value varying according to a magnetization directionthat is rewritten in response to an applied magnetic field, and anaccess element for supplying a data read current to said magneticstorage portion in a data read operation, said thin film magnetic memorydevice further comprising: a global data line and a local data line thatare arranged in a hierarchical manner, for passing therethrough a datawrite current for magnetizing said magnetic storage portion in adirection according to write data in a data write operation, whereinsaid plurality of memory cells are arranged in a matrix, said globaldata line is provided corresponding to one of every memory cell row andevery memory cell column, and said local data line is provided for everyprescribed segment of a memory cell group corresponding to a same globaldata line, said thin film magnetic memory device further comprising: adata write circuit for setting one end of one of a pair of global datalines to a first voltage and one end of the other global data line to asecond voltage according to a write data level in data write operation;and a current switch portion provided for every pair of local datalines, for connecting one of a corresponding pair of local data linesbetween corresponding two global data lines.
 4. The thin film magneticmemory device according to claim 3, further comprising: a data readcircuit for supplying said data read current to be supplied to saidmagnetic storage portion corresponding to a memory cell selected forsaid data read operation to each of a pair of global data lines in saiddata read operation and producing read data based on voltage comparisonbetween said pair of global data lines; and a reference voltagegenerating portion provided for every global data line, for generating areference voltage in response to passage of said data read current,wherein said current switch portion connects one of a corresponding pairof local data lines that corresponds to a memory cell selected for dataread operation to a corresponding global data line, and in said dataread operation, a global data line that forms a pair with saidcorresponding global data line is connected to said reference voltagegenerating portion.
 5. A thin film magnetic memory device, comprising: aplurality of memory cells for storing data, wherein each memory cellincludes a magnetic storage portion having an electric resistance valuevarying according to a magnetization direction that is rewritten inresponse to an applied magnetic field, and an access element forsupplying a data read current to said magnetic storage portion in a dataread operation, said thin film magnetic memory device furthercomprising: a global data line and a local data line that are arrangedin a hierarchical manner, for passing therethrough a data write currentfor magnetizing said magnetic storage portion in a direction accordingto write data in a data write operation; a first current switch elementfor forming a current path between said global data line and one end ofsaid local data line; and a second current switch element for forming acurrent path between said global data line and the other end of saidlocal data line.
 6. A thin film magnetic memory device, comprising: aplurality of memory cells for storing data, wherein each memory cellincludes a magnetic storage portion having an electric resistance valuevarying according to a magnetization direction that is rewritten inresponse to an applied magnetic field, and an access element forsupplying a data read current to said magnetic storage portion in a dataread operation, said thin film magnetic memory device furthercomprising: a global data line and a local data line that are arrangedin a hierarchical manner, for passing therethrough a data write currentfor magnetizing said magnetic storage portion in a direction accordingto write data in a data write operation, wherein said magnetic storageportion includes a first magnetic layer having a fixed magnetizationdirection, second and third magnetic layers that are magnetized inopposite directions according to an applied data write magnetic field, anon-magnetic, conductive intermediate layer formed between said secondand third magnetic layers, and an insulating layer formed between one ofsaid second and third magnetic layers and said first magnetic layer, andsaid local data line is formed with including the intermediate layer ofat least one memory cell of said plurality of memory cells.
 7. A thinfilm magnetic memory device, comprising: a plurality of memory cells forstoring data, wherein each memory cell includes a magnetic storageportion having an electric resistance value varying according to amagnetization direction that is rewritten in response to an appliedmagnetic field, and an access element for supplying a data read currentto said magnetic storage portion in a data read operation, said thinfilm magnetic memory device further comprising: a global data line and alocal data line that are arranged in a hierarchical manner, for passingtherethrough said data read current to be supplied to said magneticstorage portion corresponding to a memory cell selected for said dataread operation; a data read circuit for supplying said data read currentto each of a pair of global data lines in said data read operation andproducing read data based on voltage comparison between said pair ofglobal data lines; and a reference voltage generating portion providedfor every global data line, for generating a reference voltage inresponse to passage of said data read current, wherein a memory cellselected for said data read operation is electrically connected to acorresponding global data line through a corresponding local data lineand receives said data read current, and in said data read operation, aglobal data line that forms a pair with a global data line correspondingto said selected memory cell is connected to said reference voltagegenerating portion.
 8. A thin film magnetic memory device comprising: aplurality of memory cells for storing data, wherein each memory cellincludes a magnetic storage portion having an electric resistance valuevarying according to a magnetization direction that is rewritten inresponse to an applied magnetic field, and an access element forsupplying a data read current to said magnetic storage portion in a dataread operation, said thin film magnetic memory device furthercomprising: a global data line and a local data line that are arrangedin a hierarchical manner, for passing therethrough said data readcurrent to be supplied to said magnetic storage portion corresponding toa memory cell selected for said data read operation, wherein saidmagnetic storage portion includes a first magnetic layer having a fixedmagnetization direction, second and third magnetic layers that aremagnetized in opposite directions according to an applied data writemagnetic field, a non-magnetic, conductive intermediate layer formedbetween said second and third magnetic layers, and an insulating layerformed between one of said second and third magnetic layers and saidfirst magnetic layer, and said local data line is formed with includingthe intermediate layer of at least one memory cell of said plurality ofmemory cells.